发明申请
- 专利标题: SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- 专利标题(中): 半导体器件及其制造方法
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申请号: US12044299申请日: 2008-03-07
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公开(公告)号: US20080217754A1公开(公告)日: 2008-09-11
- 发明人: Akira TOJO , Tomoyuki Kitani , Tomohiro Iguchi , Masako Hirahara , Hideo Nishiuchi
- 申请人: Akira TOJO , Tomoyuki Kitani , Tomohiro Iguchi , Masako Hirahara , Hideo Nishiuchi
- 申请人地址: JP Tokyo
- 专利权人: KABUSHIKI KAISHA TOSHIBA
- 当前专利权人: KABUSHIKI KAISHA TOSHIBA
- 当前专利权人地址: JP Tokyo
- 优先权: JP2007-058564 20070308; JP2007-245852 20070921
- 主分类号: H01L23/48
- IPC分类号: H01L23/48 ; H01L21/00
摘要:
A semiconductor device includes a semiconductor chip 5 having a first surface 5a on which a first pole 5a1 of a semiconductor element is arranged and a second surface 5b on which a second pole 5b1 is arranged and which is opposed to the first surface 5a, a first conductive member 6a connected to the first surface 5a, a second conductive member 6b connected to the second surface 5b, a first external electrode 2a connected to the first conductive member 6a and having a contact area larger than the member 6a, a second external electrode 2b connected to the second conductive member 6b and having a contact area larger than the conductive member 6b and a sealing member 3 sealing up the semiconductor chip 6 and the conductive members 6 between the first external electrode 2a and the second external electrode 2b. The sealing member 3 is provided as a result of heating a sealing material for melting and subsequent hardening. A manufacturing method of the semiconductor device is also provided to improve its electrical characteristics and productivity.
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