Invention Application
US20080219590A1 Method and system for correlating physical model representation to pattern layout
有权
将物理模型表示与模式布局相关联的方法和系统
- Patent Title: Method and system for correlating physical model representation to pattern layout
- Patent Title (中): 将物理模型表示与模式布局相关联的方法和系统
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Application No.: US11716511Application Date: 2007-03-09
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Publication No.: US20080219590A1Publication Date: 2008-09-11
- Inventor: Jianliang Li , Qiliang Yan , Lawrence S. Melvin , James P. Shiely
- Applicant: Jianliang Li , Qiliang Yan , Lawrence S. Melvin , James P. Shiely
- Main IPC: G06K9/64
- IPC: G06K9/64

Abstract:
One embodiment of the present invention provides a system that reduces computational complexity in simulating an image resulting from an original mask and an optical transmission system. During operation, the system obtains a set transmission cross coefficient (TCC) kernel functions based on the optical transmission system, and obtains a set of transmission functions for a representative pattern which contains features representative of the original mask. The system constructs a new set of kernel functions based on the TCC kernel functions and the transmission functions for the representative pattern, wherein responses to the new kernel functions in a resulting image corresponding to the representative pattern are substantially uncorrelated with one another. The system further produces an intensity distribution of a resulting image corresponding to the original mask based on the new kernel functions, thereby facilitating prediction of a layout that can be produced from the original mask.
Public/Granted literature
- US07933471B2 Method and system for correlating physical model representation to pattern layout Public/Granted day:2011-04-26
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