公开(公告)号：US07933471B2

公开(公告)日：2011-04-26

申请号：US11716511

申请日：2007-03-09

Applicant: Jianliang Li ,  Qiliang Yan ,  Lawrence S. Melvin, III ,  James P. Shiely

Inventor： Jianliang Li ,  Qiliang Yan ,  Lawrence S. Melvin, III ,  James P. Shiely

IPC: G06K9/00 ,  G06K9/36 ,  G06K9/64

CPC classification number: G02B27/0012 ,  G03F1/36

Abstract: One embodiment of the present invention provides a system that reduces computational complexity in simulating an image resulting from an original mask and an optical transmission system. During operation, the system obtains a set transmission cross coefficient (TCC) kernel functions based on the optical transmission system, and obtains a set of transmission functions for a representative pattern which contains features representative of the original mask. The system constructs a new set of kernel functions based on the TCC kernel functions and the transmission functions for the representative pattern, wherein responses to the new kernel functions in a resulting image corresponding to the representative pattern are substantially uncorrelated with one another. The system further produces an intensity distribution of a resulting image corresponding to the original mask based on the new kernel functions, thereby facilitating prediction of a layout that can be produced from the original mask.

Abstract translation: 本发明的一个实施例提供一种降低模拟由原始掩模和光传输系统产生的图像的计算复杂性的系统。 在运行过程中，系统基于光传输系统获得设置的传输交叉系数（TCC）核函数，并获得一组代表性模式的传输函数，其中代表性模式包含代表原始掩码的特征。 该系统基于TCC内核功能和代表性模式的传输功能构建新的一组内核函数，其中对应于代表性模式的所得图像中对新内核功能的响应基本上彼此不相关。 该系统进一步基于新的内核函数产生对应于原始掩码的结果图像的强度分布，从而有助于预测可以从原始掩模产生的布局。

公开(公告)号：US07739645B2

公开(公告)日：2010-06-15

申请号：US11800171

申请日：2007-05-04

Applicant: Jianliang Li ,  Qiliang Yan ,  Lawrence S. Melvin, III

Inventor： Jianliang Li ,  Qiliang Yan ,  Lawrence S. Melvin, III

IPC: G06F17/50

CPC classification number: G06F17/5068 ,  G06F2217/10

Abstract: One embodiment provides a system for determining an improved process model that models one or more semiconductor manufacturing processes. During operation, the system can receive a first process model. Next, the system can receive a 2-D-pattern detecting kernel which can detect 2-D patterns. The system can then receive a second set of empirical data which is associated with 2-D patterns in a test layout. Next, the system can determine an improved process model using the first process model, the 2-D-pattern detecting kernel, the test layout, and the second set of empirical data.

Abstract translation: 一个实施例提供了一种用于确定对一个或多个半导体制造工艺进行建模的改进的工艺模型的系统。 在运行过程中，系统可以接收第一个流程模型。 接下来，系统可以接收可以检测2-D图案的2-D图案检测内核。 然后，系统可以接收与测试布局中的2-D模式相关联的第二组经验数据。 接下来，系统可以使用第一过程模型，2-D模式检测内核，测试布局和第二组经验数据来确定改进的过程模型。

公开(公告)号：US20080219590A1

公开(公告)日：2008-09-11

申请号：US11716511

申请日：2007-03-09

Applicant: Jianliang Li ,  Qiliang Yan ,  Lawrence S. Melvin ,  James P. Shiely

Inventor： Jianliang Li ,  Qiliang Yan ,  Lawrence S. Melvin ,  James P. Shiely

IPC: G06K9/64

CPC classification number: G02B27/0012 ,  G03F1/36

Abstract: One embodiment of the present invention provides a system that reduces computational complexity in simulating an image resulting from an original mask and an optical transmission system. During operation, the system obtains a set transmission cross coefficient (TCC) kernel functions based on the optical transmission system, and obtains a set of transmission functions for a representative pattern which contains features representative of the original mask. The system constructs a new set of kernel functions based on the TCC kernel functions and the transmission functions for the representative pattern, wherein responses to the new kernel functions in a resulting image corresponding to the representative pattern are substantially uncorrelated with one another. The system further produces an intensity distribution of a resulting image corresponding to the original mask based on the new kernel functions, thereby facilitating prediction of a layout that can be produced from the original mask.

Abstract translation: 本发明的一个实施例提供一种降低模拟由原始掩模和光传输系统产生的图像的计算复杂性的系统。 在运行过程中，系统基于光传输系统获得设置的传输交叉系数（TCC）核函数，并获得一组代表性模式的传输函数，其中代表性模式包含代表原始掩码的特征。 该系统基于TCC内核功能和代表性模式的传输功能构建新的一组内核函数，其中对应于代表性模式的所得图像中对新内核功能的响应基本上彼此不相关。 该系统进一步基于新的内核函数产生对应于原始掩码的结果图像的强度分布，从而有助于预测可以从原始掩模产生的布局。

公开(公告)号：US20070144614A1

公开(公告)日：2007-06-28

申请号：US11610511

申请日：2006-12-14

Applicant: Zhichao Lu ,  Deren Li ,  Shaoxiong Zhou ,  Caowei Lu ,  Feng Guo ,  Jianliang Li ,  Jun Wang ,  Tongchun Zhao ,  Liang Zhang

Inventor： Zhichao Lu ,  Deren Li ,  Shaoxiong Zhou ,  Caowei Lu ,  Feng Guo ,  Jianliang Li ,  Jun Wang ,  Tongchun Zhao ,  Liang Zhang

IPC: H01F1/09

CPC classification number: H01F1/15358 ,  B22F1/0059 ,  B22F2003/248 ,  B22F2998/10 ,  C22C33/0257 ,  H01F1/14791 ,  H01F1/15333 ,  H01F1/24 ,  H01F1/33 ,  H01F41/0246 ,  B22F1/0003 ,  B22F3/02 ,  B22F3/24

Abstract: The present invention provides a compound powder for making magnetic powder cores, a kind of magnetic powder core, and a process for making them. Said compound powder is a mixture composing of powder A and powder B, the content of powder A is 50-96 wt % and the content of powder B is 4-50 wt %, wherein powder A is at least one selected from iron powder, Fe—Si powder, Fe—Si—Al powder, Fe-based nanocrystalline powder, Fe-based amorphous powder, Fe—Ni powder and Fe—Ni—Mo powder; powder B bears different requirement characteristics from powder A and is at least one selected from iron powder, Fe—Si powder, Fe—Si—Al powder, Fe-based nanocrystalline powder, Fe-based amorphous powder, Fe—Ni powder and Fe—Ni—Mo powder. Said powder B adopts Fe-based amorphous soft magnetic powder with good insulation property as insulating agent and thus core loss of magnetic powder core decreases. The decrease of magnetic permeability of magnetic powder core resulting from a traditional insulating agent is remedied and the initial magnetic permeability of magnetic powder core is improved by taking advantage of soft magnetic properties of Fe-based amorphous powder.

Abstract translation: 本发明提供一种用于制造磁性粉末芯的复合粉末，一种磁性粉末核心及其制造方法。 所述复合粉末是由粉末A和粉末B组成的混合物，粉末A的含量为50-96重量％，粉末B的含量为4-50重量％，其中粉末A为选自铁粉， Fe-Si粉末，Fe-Si-Al粉末，Fe基纳米晶体粉末，Fe基非晶质粉末，Fe-Ni粉末和Fe-Ni-Mo粉末; 粉末B与粉末A具有不同的要求特性，并且选自铁粉，Fe-Si粉末，Fe-Si-Al粉末，Fe基纳米晶体粉末，Fe基非晶质粉末，Fe-Ni粉末和Fe- 镍钼粉。 所述粉末B采用具有良好绝缘性能的铁基非晶软磁粉末作为绝缘剂，因此磁粉芯的磁芯损耗降低。 补充了由传统绝缘剂导致的磁粉芯磁导率的降低，并通过利用Fe基非晶态粉末的软磁性能改善了磁粉芯的初始磁导率。

公开(公告)号：US20100034687A1

公开(公告)日：2010-02-11

申请号：US12581164

申请日：2009-10-19

Applicant: Zhichao Lu ,  Deren Li ,  Shaoxiong Zhou ,  Caowei Lu ,  Feng Guo ,  Jianliang Li ,  Jun Wang ,  Tongchun Zhao ,  Liang Zhang

Inventor： Zhichao Lu ,  Deren Li ,  Shaoxiong Zhou ,  Caowei Lu ,  Feng Guo ,  Jianliang Li ,  Jun Wang ,  Tongchun Zhao ,  Liang Zhang

IPC: H01F41/02 ,  B22F1/00 ,  B22F3/12 ,  B22F3/24

CPC classification number: H01F1/15358 ,  B22F1/0059 ,  B22F2003/248 ,  B22F2998/10 ,  C22C33/0257 ,  H01F1/14791 ,  H01F1/15333 ,  H01F1/24 ,  H01F1/33 ,  H01F41/0246 ,  B22F1/0003 ,  B22F3/02 ,  B22F3/24

Abstract: The present invention provides a compound powder for making magnetic powder cores, a kind of magnetic powder core, and a process for making them. Said compound powder is a mixture composing of powder A and powder B, the content of powder A is 50-96 wt. % and the content of powder B is 4-50 wt. %, wherein powder A is at least one selected from iron powder, Fe—Si powder, Fe—Si—Al powder, Fe-based nanocrystalline powder, Fe-based amorphous powder, Fe—Ni powder and Fe—Ni—Mo powder; powder B bears different requirement characteristics from powder A and is at least one selected from iron powder, Fe—Si powder, Fe—Si—Al powder, Fe-based nanocrystalline powder, Fe-based amorphous powder, Fe—Ni powder and Fe—Ni—Mo powder. Said powder B adopts Fe-based amorphous soft magnetic powder with good insulation property as insulating agent and thus core loss of magnetic powder core decreases. The decrease of magnetic permeability of magnetic powder core resulting from a traditional insulating agent is remedied and the initial magnetic permeability of magnetic powder core is improved by taking advantage of soft magnetic properties of Fe-based amorphous powder.

Abstract translation: 本发明提供一种用于制造磁性粉末芯的复合粉末，一种磁性粉末核心及其制造方法。 所述复合粉末是由粉末A和粉末B组成的混合物，粉末A的含量为50-96重量％。 ％，粉末B的含量为4-50wt。 ％，其中粉末A为选自铁粉，Fe-Si粉末，Fe-Si-Al粉末，Fe基纳米晶体粉末，Fe基非晶质粉末，Fe-Ni粉末和Fe-Ni-Mo粉末中的至少一种; 粉末B与粉末A具有不同的要求特性，并且选自铁粉，Fe-Si粉末，Fe-Si-Al粉末，Fe基纳米晶体粉末，Fe基非晶质粉末，Fe-Ni粉末和Fe- 镍钼粉。 所述粉末B采用具有良好绝缘性能的铁基非晶软磁粉末作为绝缘剂，因此磁粉芯的磁芯损耗降低。 补充了由传统绝缘剂导致的磁粉芯磁导率的降低，并通过利用Fe基非晶态粉末的软磁性能改善了磁粉芯的初始磁导率。

公开(公告)号：US20100031773A1

公开(公告)日：2010-02-11

申请号：US12581163

申请日：2009-10-19

Applicant: Zhichao Lu ,  Deren Li ,  Shaoxiong Zhou ,  Caowei Lu ,  Feng Guo ,  Jianliang Li ,  Jun Wang ,  Tongchun Zhao ,  Liang Zhang

Inventor： Zhichao Lu ,  Deren Li ,  Shaoxiong Zhou ,  Caowei Lu ,  Feng Guo ,  Jianliang Li ,  Jun Wang ,  Tongchun Zhao ,  Liang Zhang

IPC: B22F9/00 ,  B22F1/00

CPC classification number: H01F1/15358 ,  B22F1/0059 ,  B22F2003/248 ,  B22F2998/10 ,  C22C33/0257 ,  H01F1/14791 ,  H01F1/15333 ,  H01F1/24 ,  H01F1/33 ,  H01F41/0246 ,  B22F1/0003 ,  B22F3/02 ,  B22F3/24

Abstract: The present invention provides a compound powder for making magnetic powder cores, a kind of magnetic powder core, and a process for making them. Said compound powder is a mixture composing of powder A and powder B, the content of powder A is 50-96 wt. % and the content of powder B is 4-50 wt. %, wherein powder A is at least one selected from iron powder, Fe—Si powder, Fe—Si—Al powder, Fe-based nanocrystalline powder, Fe-based amorphous powder, Fe—Ni powder and Fe—Ni—Mo powder; powder B bears different requirement characteristics from powder A and is at least one selected from iron powder, Fe—Si powder, Fe—Si—Al powder, Fe-based nanocrystalline powder, Fe-based amorphous powder, Fe—Ni powder and Fe—Ni—Mo powder. Said powder B adopts Fe-based amorphous soft magnetic powder with good insulation property as insulating agent and thus core loss of magnetic powder core decreases. The decrease of magnetic permeability of magnetic powder core resulting from a traditional insulating agent is remedied and the initial magnetic permeability of magnetic powder core is improved by taking advantage of soft magnetic properties of Fe-based amorphous powder.

公开(公告)号：US20070038973A1

公开(公告)日：2007-02-15

申请号：US11584737

申请日：2006-10-19

Applicant: Jianliang Li ,  Qiliang Yan ,  Lawrence Melvin ,  Levi Barnes ,  Alakananda Biswas ,  Abani Biswas

Inventor： Jianliang Li ,  Qiliang Yan ,  Lawrence Melvin ,  Levi Barnes ,  Alakananda Biswas ,  Abani Biswas

IPC: G06F17/50

CPC classification number: G06F17/5068 ,  G03F1/36 ,  G03F7/705

Abstract: One embodiment of the present invention determines the effect of placing an assist feature at a location in a layout. During operation, the system receives a first value which was pre-computed by convolving a model with a layout at an evaluation point, wherein the model models semiconductor manufacturing processes. Next, the system determines a second value by convolving the model with an assist feature, which is assumed to be located at a first location which is in proximity to the evaluation point. The system then determines the effect of placing an assist feature using the first value and the second value. An embodiment of the present invention can be used to determine a substantially optimal location for placing an assist feature in a layout.

Abstract translation: 本发明的一个实施例确定了在布局中的位置放置辅助特征的效果。 在操作期间，系统接收通过在评估点卷积具有布局的模型而预先计算的第一值，其中模型对半导体制造过程进行建模。 接下来，系统通过将模型与辅助特征进行卷积来确定第二值，所述辅助特征被假设为位于靠近评估点的第一位置。 然后，系统使用第一值和第二值确定放置辅助特征的效果。 可以使用本发明的实施例来确定用于将辅助特征放置在布局中的基本最佳位置。

公开(公告)号：US08296688B2

公开(公告)日：2012-10-23

申请号：US13094749

申请日：2011-04-26

Applicant: Levi D. Barnes ,  Benjamin D. Painter ,  Qiliang Yan ,  Yongfa Fan ,  Jianliang Li ,  Amyn Poonawala

Inventor： Levi D. Barnes ,  Benjamin D. Painter ,  Qiliang Yan ,  Yongfa Fan ,  Jianliang Li ,  Amyn Poonawala

IPC: G06F17/50

CPC classification number: G03F1/70 ,  G03F1/36 ,  G03F7/70433 ,  G03F7/70441 ,  G03F7/705 ,  G03F7/70641

Abstract: One embodiment of the present invention provides a system that determines an assist feature placement within a post-optical proximity correction (post-OPC) mask layout. During operation, the system receives a set of target patterns which represent a set of polygons in a pre-OPC mask layout. The system then constructs a focus-sensitive cost function based on the target patterns, wherein the focus-sensitive cost function represents an amount of movement of post-OPC contours of the target patterns in response to changes in focus condition of the lithography system. Next, the system computes a cost-covariance field (CCF field) based on the focus-sensitive cost function, wherein the CCF field is a two-dimensional (2D) map representing changes to the focus-sensitive cost function due to an addition of a pattern at a given location within the post-OPC mask layout. Finally, the system generates assist features for the post-OPC mask layout based on the CCF field.

Abstract translation: 本发明的一个实施例提供了一种系统，其确定后光学邻近校正（后OPC）掩模布局中的辅助特征放置。 在操作期间，系统接收一组目标图案，这些目标图案表示预OPC掩模布局中的一组多边形。 然后，系统基于目标图案构建对焦敏感的成本函数，其中焦点敏感成本函数表示响应于光刻系统的聚焦条件的变化的目标图案的OPC后轮廓的移动量。 接下来，系统基于焦点敏感成本函数计算成本协方差字段（CCF字段），其中CCF字段是表示由于添加了对焦敏感成本函数而导致的对焦敏感成本函数的改变的二维（2D）映射 在后OPC掩模布局中的给定位置处的图案。 最后，系统基于CCF字段生成后OPC掩模布局的辅助功能。

公开(公告)号：US20100115486A1

公开(公告)日：2010-05-06

申请号：US12263354

申请日：2008-10-31

Applicant: Levi D. Barnes ,  Benjamin D. Painter ,  Qiliang Yang ,  Yongfa Fan ,  Jianliang Li ,  Amyn Poonawala

Inventor： Levi D. Barnes ,  Benjamin D. Painter ,  Qiliang Yang ,  Yongfa Fan ,  Jianliang Li ,  Amyn Poonawala

IPC: G06F17/50

CPC classification number: G03F1/70 ,  G03F1/36 ,  G03F7/70433 ,  G03F7/70441 ,  G03F7/705 ,  G03F7/70641

Abstract: One embodiment of the present invention provides a system that determines an assist feature placement within a post-optical proximity correction (post-OPC) mask layout. During operation, the system receives a set of target patterns which represent a set of polygons in a pre-OPC mask layout. The system then constructs a focus-sensitive cost function based on the target patterns, wherein the focus-sensitive cost function represents an amount of movement of post-OPC contours of the target patterns in response to changes in focus condition of the lithography system. Note that the contours of the target patterns substantially coincide with the edges of set of the polygons. Next, the system computes a cost-covariance field (CCF field) based on the focus-sensitive cost function, wherein the CCF field is a two-dimensional (2D) map representing changes to the focus-sensitive cost function due to an addition of a pattern at a given location within the post-OPC mask layout. Finally, the system generates assist features for the post-OPC mask layout based on the CCF field.

Abstract translation: 本发明的一个实施例提供了一种系统，其确定后光学邻近校正（后OPC）掩模布局中的辅助特征放置。 在操作期间，系统接收一组目标图案，这些目标图案表示预OPC掩模布局中的一组多边形。 然后，系统基于目标图案构建对焦敏感的成本函数，其中焦点敏感成本函数表示响应于光刻系统的聚焦条件的变化的目标图案的OPC后轮廓的移动量。 注意，目标图案的轮廓基本上与多边形的集合的边缘重合。 接下来，系统基于焦点敏感成本函数计算成本协方差字段（CCF字段），其中CCF字段是表示由于添加了对焦敏感成本函数而导致的对焦敏感成本函数的改变的二维（2D）映射 在后OPC掩模布局中的给定位置处的图案。 最后，系统基于CCF字段生成后OPC掩模布局的辅助功能。

公开(公告)号：US20080235651A1

公开(公告)日：2008-09-25

申请号：US11726505

申请日：2007-03-21

Applicant: Jianliang Li ,  Qilang Yan ,  Lawrence S. Melvin

Inventor： Jianliang Li ,  Qilang Yan ,  Lawrence S. Melvin

IPC: G06F17/50 ,  G06F19/00 ,  G03F1/00 ,  G21K5/00

CPC classification number: G03F1/36

Abstract: One embodiment provides a system that can enable a designer to determine the effects of subsequent processes at design time. During operation, the system may receive a test layout and an optical model that models an optical system, but which does not model the effects of subsequent processes, such as optical proximity correction (OPC). The system may generate a first dataset using the test layout and the optical model. Next, the system may apply OPC to the test layout, and generate a second dataset using the corrected test layout and the optical model. The system may then use the first dataset and the second dataset to adjust the optical model to obtain a second optical model that models the effects of subsequent processes.

Abstract translation: 一个实施例提供了一种能够使设计者在设计时确定后续处理的效果的系统。 在操作期间，系统可以接收测试布局和对光学系统进行建模但不对后续过程的影响进行建模的光学模型，例如光学邻近校正（OPC）。 系统可以使用测试布局和光学模型生成第一个数据集。 接下来，系统可以将OPC应用于测试布局，并使用校正的测试布局和光学模型生成第二数据集。 然后，系统可以使用第一数据集和第二数据集来调整光学模型以获得对随后过程的影响进行建模的第二光学模型。