发明申请
- 专利标题： CHEMICALLY AMPLIFIED RESIST COMPOSITION
- 专利标题（中）： 化学稳定组分
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申请号： US12042242申请日： 2008-03-04
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公开(公告)号： US20080220369A1公开(公告)日： 2008-09-11
- 发明人: Satoshi YAMAGUCHI , Yoshiyuki TAKATA , Satoshi YAMAMOTO
- 申请人： Satoshi YAMAGUCHI , Yoshiyuki TAKATA , Satoshi YAMAMOTO
- 申请人地址： JP Tokyo
- 专利权人： SUMITOMO CHEMICAL COMPANY, LIMITED
- 当前专利权人： SUMITOMO CHEMICAL COMPANY, LIMITED
- 当前专利权人地址： JP Tokyo
- 优先权： JP2007-056890 20070307
- 主分类号： G03F7/027
- IPC分类号： G03F7/027
摘要：
The present invention provides a chemically amplified resist composition containing: (A) a salt represented by the formula (I): A+−O3S-Q1 (I) wherein A+ and Q1 are defined in the specification; (B) a salt represented by the formula (II): wherein R22, A3, A4 and A′+ are defined in the specification; and (C) a resin which contains a structural unit having an acid-labile group and which itself is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid.