发明申请
US20080227030A1 Use of Mixed Bases to Enhance Patterned Resist Profiles on Chrome or Sensitive Substrates
有权
使用混合基材来增强铬或敏感基材上的图案化抗蚀剂型材
- 专利标题： Use of Mixed Bases to Enhance Patterned Resist Profiles on Chrome or Sensitive Substrates
- 专利标题（中）： 使用混合基材来增强铬或敏感基材上的图案化抗蚀剂型材
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申请号： US10597904申请日： 2004-02-11
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公开(公告)号： US20080227030A1公开(公告)日： 2008-09-18
- 发明人: Wayne M. Moreau , Marie Angelopoulos , Wu-Song Huang , David R. Medeiros , Karen E. Petrillo
- 申请人： Wayne M. Moreau , Marie Angelopoulos , Wu-Song Huang , David R. Medeiros , Karen E. Petrillo
- 申请人地址： US NY Armonk
- 专利权人： INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人： INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人地址： US NY Armonk
- 国际申请： PCT/US04/04144 WO 20040211
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/34
摘要：
Resist compositions having good footing properties even on difficult substrates are obtained by using a combination of base additives including a room temperature solid base, and a liquid low vapor pressure base. The compositions are especially useful on metal substrates such as chromium-containing layers commonly used in mask-making.
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