发明申请
- 专利标题: SEMICONDUCTOR DEVICE AND FABRICATION METHOD OF SAME
- 专利标题(中): 半导体器件及其制造方法
-
申请号: US12036703申请日: 2008-02-25
-
公开(公告)号: US20080230804A1公开(公告)日: 2008-09-25
- 发明人: Yoshifumi Nishi , Takashi Yamauchi , Yoshinori Tsuchiya , Junji Koga
- 申请人: Yoshifumi Nishi , Takashi Yamauchi , Yoshinori Tsuchiya , Junji Koga
- 申请人地址: JP Tokyo
- 专利权人: KABUSHIKI KAISHA TOSHIBA
- 当前专利权人: KABUSHIKI KAISHA TOSHIBA
- 当前专利权人地址: JP Tokyo
- 优先权: JP2007-073839 20070322
- 主分类号: H01L27/092
- IPC分类号: H01L27/092 ; H01L21/8238 ; H01L29/872 ; H01L21/283
摘要:
A semiconductor device having an electrode with reduced electrical contact resistance even where either electrons or holes are majority carriers is disclosed. This device has an n-type diffusion layer and a p-type diffusion layer in a top surface of a semiconductor substrate. The device also has first and second metal wires patterned to overlie the n-type and p-type diffusion layers, respectively, with a dielectric layer interposed therebetween, a first contact electrode for electrical connection between the n-type diffusion layer and the first metal wire, and a second contact electrode for connection between the p-type diffusion layer and the second metal wire. The first contact electrode's portion in contact with the n-type diffusion layer and the second contact electrode's portion contacted with the p-type diffusion layer are each formed of a first conductor that contains a metal and a second conductor containing a rare earth metal.
公开/授权文献
- US07642604B2 Semiconductor device and fabrication method of same 公开/授权日:2010-01-05
信息查询
IPC分类: