发明申请
- 专利标题: Method and system for patterning a mask layer
- 专利标题(中): 图案化掩模层的方法和系统
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申请号: US11731689申请日: 2007-03-30
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公开(公告)号: US20080241712A1公开(公告)日: 2008-10-02
- 发明人: Scott Jong Ho Limb , Eric J. Shrader , Uma Srinivasan
- 申请人: Scott Jong Ho Limb , Eric J. Shrader , Uma Srinivasan
- 专利权人: PALO ALTO RESEARCH CENTER INCORPORATED.
- 当前专利权人: PALO ALTO RESEARCH CENTER INCORPORATED.
- 主分类号: G03F1/00
- IPC分类号: G03F1/00
摘要:
The presently described embodiments use a printing process, e.g. a wax printing technique, to pattern a mask layer (such as a soldermask layer) of, for example, a printed circuit. Substantially all other conventional processes in developing soldermask and exposure processes can be maintained. According to the presently described embodiments, each printed circuit will have a unique pattern that matches uniform and non-uniform runout. In one form, the pattern is comprised of wax single drops having a specified gap to make the process transparent to the current industry practice. Furthermore, the single drops can be used for both large and small areas without any development time differences. In at least one form, the wax pattern and the soldermask in the gap are removed during development.
公开/授权文献
- US08968985B2 Method and system for patterning a mask layer 公开/授权日:2015-03-03
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