发明申请
US20080245555A1 CIRCUIT SUBSTRATE WITH PLATED THROUGH HOLE STRUCTURE AND METHOD
审中-公开
具有通孔结构和方法的电路基板
- 专利标题: CIRCUIT SUBSTRATE WITH PLATED THROUGH HOLE STRUCTURE AND METHOD
- 专利标题(中): 具有通孔结构和方法的电路基板
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申请号: US11696285申请日: 2007-04-04
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公开(公告)号: US20080245555A1公开(公告)日: 2008-10-09
- 发明人: Yue Li , Vincent Chan , Neil Mclellan , Liane Martinez
- 申请人: Yue Li , Vincent Chan , Neil Mclellan , Liane Martinez
- 申请人地址: CA Markham
- 专利权人: ATI Technologies ULC
- 当前专利权人: ATI Technologies ULC
- 当前专利权人地址: CA Markham
- 主分类号: H05K1/11
- IPC分类号: H05K1/11 ; H01R12/04
摘要:
A circuit substrate includes an outer plated through hole structure and an inner plated through hole structure located within the outer plated through hole structure. In one example, the circuit substrate includes a core and an outer plated through hole structure having a first metal layer configured over the core to form an outer plated through hole. The circuit substrate also includes an inner plated through hole structure located within the outer plated through hole structure having a second metal layer positioned inside of the outer plated through hole with an insulation layer interposed between the first and second metal layers. Methods for making such a circuit substrate are also described.
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