发明申请
- 专利标题： Cvd-Reactor with Slidingly Mounted Susceptor Holder
- 专利标题（中）： Cvd反应堆与滑动式的受体支架
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申请号： US12093940申请日： 2006-11-17
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公开(公告)号： US20080251020A1公开(公告)日： 2008-10-16
- 发明人: Walter Franken , Johannes Kappeler
- 申请人： Walter Franken , Johannes Kappeler
- 优先权： DE102005055252.8 20051119
- 国际申请： PCT/EP06/68621 WO 20061117
- 主分类号： C23C16/00
- IPC分类号： C23C16/00
摘要：
The invention relates to a device for depositing at least one layer on a substrate having one or more susceptors (7) for receiving substrates, comprising a substrate holder (6) that can be rotatably driven and forms the bottom of a process chamber (2), a RF heating system (22) disposed below the susceptor holder (6) and a gas inlet element (4) for introducing process gases into the process chamber. In order to further develop the generic device and to improve the production and advantages of use, it is proposed that the susceptor holder (6) lies in a sliding manner on an essentially IR- and/or RF-permeable supporting plate (14).
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