Invention Application
- Patent Title: Embossing Device with a Deflection Compensated Roller
- Patent Title (中): 带有偏转补偿辊的压花装置
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Application No.: US11660053Application Date: 2005-08-05
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Publication No.: US20080251956A1Publication Date: 2008-10-16
- Inventor: Raimo Korhonen , Pekka Koivukunnas
- Applicant: Raimo Korhonen , Pekka Koivukunnas
- Applicant Address: FI Tampere
- Assignee: AVANTONE OY
- Current Assignee: AVANTONE OY
- Current Assignee Address: FI Tampere
- Priority: FI20045294 20040813
- International Application: PCT/FI05/50287 WO 20050805
- Main IPC: B29D11/00
- IPC: B29D11/00

Abstract:
A diffractive microstructure is produced on the surface layer of a substrate using an embossing device. The embossing device includes an embossing roll and a backing roll for exerting an embossing pressure on the surface layer of the substrate. The embossing pressure and/or variations in temperature cause deflection of the embossing roll. To compensate for the deflection, the embossing device can set the embossing pressure exerted by the central area of the embossing roll on the surface layer of the substrate to be at least equal to or higher than the embossing pressure exerted by the end areas of the embossing roll on the surface layer of the substrate.
Information query