发明申请
- 专利标题： SELECTIVE SURFACE TREATMENT METHOD USING BLOCK COPOLYMER, BLACK MATRIX AND METHOD OF MANUFACTURING THE SAME, AND NOZZLE PLATE AND METHOD OF MANUFACTURING THE SAME
- 专利标题（中）： 使用嵌段共聚物，黑色矩阵及其制造方法的选择性表面处理方法和喷嘴板及其制造方法
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申请号： US11877156申请日： 2007-10-23
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公开(公告)号： US20080261129A1公开(公告)日： 2008-10-23
- 发明人: Tae-woon Cha , Wou-sik Kim , Seong-jin Kim
- 申请人： Tae-woon Cha , Wou-sik Kim , Seong-jin Kim
- 申请人地址： KR Suwon-si
- 专利权人： Samsung Electronics Co., Ltd.
- 当前专利权人： Samsung Electronics Co., Ltd.
- 当前专利权人地址： KR Suwon-si
- 优先权： KR2007-39441 20070423
- 主分类号： G03F1/00
- IPC分类号： G03F1/00 ; B05B7/00 ; B05D1/36 ; B44C1/22
摘要：
A selective surface treatment method using a block copolymer, a black matrix and a method of manufacturing the same, and a nozzle plate and a method of manufacturing the same are provided. According to the selective surface treatment method, a block copolymer layer including a hydrophilic polymer block and a hydrophobic polymer block is formed on a predetermined surface of a substrate.
公开/授权文献
- US08156650B2 Method of manufacturing a nozzle plate 公开/授权日：2012-04-17
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