发明申请
- 专利标题: DOUBLE MESH FINFET
- 专利标题(中): 双金属FINFET
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申请号: US11739420申请日: 2007-04-24
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公开(公告)号: US20080265290A1公开(公告)日: 2008-10-30
- 发明人: Alexander Nielsen , Bernhard Dobler , Georg Georgakos , Ralf Weber
- 申请人: Alexander Nielsen , Bernhard Dobler , Georg Georgakos , Ralf Weber
- 申请人地址: DE MUNICH
- 专利权人: INFINEON TECHNOLOGIES AG
- 当前专利权人: INFINEON TECHNOLOGIES AG
- 当前专利权人地址: DE MUNICH
- 主分类号: H01L29/76
- IPC分类号: H01L29/76
摘要:
A multiple gate field-effect transistor is built from an overlapping mesh assembly. The assembly comprises a first layer comprising a semiconductor material formed into at least one fin, a least one source, and at least one drain. The first layer comprises a portion of a first mesh, electrically separated from the rest of the mesh. Similarly, a second layer is formed over the first layer and electrically isolated from the first layer, the second layer being electrically conductive and comprising a gate for the at least one fin of the transistor. The second layer comprises a portion of a second mesh offset from the first mesh and overlapping the first mesh, the second layer of the MuGFET device electrically separated from the rest of the second mesh.
公开/授权文献
- US07453125B1 Double mesh finfet 公开/授权日:2008-11-18
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