发明申请
- 专利标题: Channel Method For Forming A Capacitor
- 专利标题(中): 形成电容器的通道方法
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申请号: US12098593申请日: 2008-04-07
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公开(公告)号: US20080273291A1公开(公告)日: 2008-11-06
- 发明人: Keith R. Brenneman , Chris Wayne , Chris Stolarski , John T. Kinard , Alethia Melody , Gregory J. Dunn , Remy J. Chellni , Robert T. Croswell
- 申请人: Keith R. Brenneman , Chris Wayne , Chris Stolarski , John T. Kinard , Alethia Melody , Gregory J. Dunn , Remy J. Chellni , Robert T. Croswell
- 主分类号: H01G9/00
- IPC分类号: H01G9/00
摘要:
An improved method for forming a capacitor. The method includes: providing a carrier with a channel therein; providing a metal foil with a valve metal with a first dielectric on a first face of the metal foil; securing the metal foil into the channel with the first dielectric away from a channel floor; inserting an insulative material between the metal foil and each side wall of the channel; forming a cathode layer on the first dielectric between the insulative material; forming a conductive layer on the cathode layer and in electrical contact with the carrier; lap cutting the carrier parallel to the metal foil such that the valve metal is exposed; and dice cutting to form singulated capacitors.
公开/授权文献
- US07833292B2 Channel method for forming a capacitor 公开/授权日:2010-11-16