发明申请
- 专利标题： Photolytic Polymer Surface Modification
- 专利标题（中）： 光解聚合物表面改性
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申请号： US11722074申请日： 2005-12-16
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公开(公告)号： US20080274335A1公开(公告)日： 2008-11-06
- 发明人: Christopher N. Bowman , Sirish Reddy , Neil Cramer , Robert P. Sebra , Hui Lu
- 申请人： Christopher N. Bowman , Sirish Reddy , Neil Cramer , Robert P. Sebra , Hui Lu
- 申请人地址： US CO Boulder
- 专利权人： REGENTS OF THE UNIVERSITY OF COLORADO
- 当前专利权人： REGENTS OF THE UNIVERSITY OF COLORADO
- 当前专利权人地址： US CO Boulder
- 国际申请： PCT/US05/46147 WO 20051216
- 主分类号： B32B3/30
- IPC分类号： B32B3/30 ; C08J3/28 ; C08G75/04
摘要：
The present invention provides a method for modifying a surface of a polymer derived from a mixture comprising a thiol monomer and an olefinic monomer. The method comprises exposing at least a portion of the polymer surface to electromagnetic radiation of sufficient energy to modify the polymer surface. The present invention also provides a polymer derived from polymerizing a mixture of monomers comprising a thiol monomer, an olefinic monomer, and an iniferter.
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