发明申请
- 专利标题: METHOD AND APPARATUS FOR FABRICATING HIGH TENSILE STRESS FILM
- 专利标题(中): 用于制备高拉应力膜的方法和装置
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申请号: US11758623申请日: 2007-06-05
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公开(公告)号: US20080305600A1公开(公告)日: 2008-12-11
- 发明人: Hsiu-Lien Liao , Neng-Kuo Chen , Teng-Chun Tsai , Yi-Wei Chen
- 申请人: Hsiu-Lien Liao , Neng-Kuo Chen , Teng-Chun Tsai , Yi-Wei Chen
- 主分类号: H01L21/336
- IPC分类号: H01L21/336 ; H01J37/08
摘要:
A method and an apparatus for fabricating a high tensile stress film includes providing a substrate, forming a poly stressor on the substrate, and performing an ultra violet rapid thermal process (UVRTP) for curing the poly stressor and adjusting its tensile stress status, thus the poly stressor serves as a high tensile stress film. Due to a combination of energy from photons and heat, the tensile stress status of the high tensile stress film is adjusted in a relatively shorter process period or under a relatively lower temperature.
公开/授权文献
- US07846804B2 Method for fabricating high tensile stress film 公开/授权日:2010-12-07
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