发明申请
- 专利标题: Method for producing metal thin film
- 专利标题(中): 金属薄膜的制造方法
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申请号: US12157473申请日: 2008-06-11
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公开(公告)号: US20080307991A1公开(公告)日: 2008-12-18
- 发明人: Masanobu Tanaka , Hirotsugu Ishihara , Toshiki Shimamura , Takahiro Kamei
- 申请人: Masanobu Tanaka , Hirotsugu Ishihara , Toshiki Shimamura , Takahiro Kamei
- 申请人地址: JP Tokyo
- 专利权人: Sony Corporation
- 当前专利权人: Sony Corporation
- 当前专利权人地址: JP Tokyo
- 优先权: JPJP2007-158341 20070615
- 主分类号: B41L17/08
- IPC分类号: B41L17/08
摘要:
A method for producing a metal thin film on a substrate includes: a step of applying an ink to a flat blanket; a first transfer step of bringing the first blanket and a letterpress having a predetermined pattern of projections into contact by a pressure compression while the flat blanked and the letterpress being disposed opposite each other, to selectively transfer a portion of the ink on the flat blanket corresponding to the projections to the letterpress; a second transfer step of bringing the flat blanket obtained after the first transfer step and the substrate into contact by pressure compression while the flat blanket and the substrate being disposed opposite each other, to transfer the ink remaining on the flat blanket to the substrate; and a step of subjecting the substrate obtained after the second transfer step to electroless plating to deposit a metal thin film on the substrate.
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