发明申请
- 专利标题： Contamination prevention system, lithographic apparatus, radiation source, and method for manufacturing a device
- 专利标题（中）： 防污染系统，光刻设备，辐射源及其制造方法
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申请号： US11808778申请日： 2007-06-12
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公开(公告)号： US20080309893A1公开(公告)日： 2008-12-18
- 发明人: Edwin Johan Buis , Erik Theodorus Maria Bijlaart , Christiaan Alexander Hoogendam , Alexander Matthijs Struycken , Arnoud Cornelis Wassink , Paul Peter Anna Antonius Brom
- 申请人： Edwin Johan Buis , Erik Theodorus Maria Bijlaart , Christiaan Alexander Hoogendam , Alexander Matthijs Struycken , Arnoud Cornelis Wassink , Paul Peter Anna Antonius Brom
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03B27/52
- IPC分类号： G03B27/52
摘要：
A contamination prevention system is constructed and arranged to prevent material from propagating with radiation into a lithographic apparatus. The contamination prevention system includes a rotatable carrier provided with a plurality of generally radially outwardly extending blades. The blades are constructed and arranged to absorb or deflect the material. The system also includes a stationary shaft, and a bearing constructed and arranged to rotate the rotatable carrier and the blades around the shaft. The rotatable carrier is provided with a space for at least partially receiving a portion of the shaft.
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