发明申请
- 专利标题： Dynamic fluid control system for immersion lithography
- 专利标题（中）： 用于浸没式光刻的动态流体控制系统
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申请号： US12222421申请日： 2008-08-08
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公开(公告)号： US20080309895A1公开(公告)日： 2008-12-18
- 发明人: Michael Sogard
- 申请人： Michael Sogard
- 申请人地址： JP Tokyo
- 专利权人： NIKON CORPORATION
- 当前专利权人： NIKON CORPORATION
- 当前专利权人地址： JP Tokyo
- 主分类号： G03B27/42
- IPC分类号： G03B27/42 ; G03B27/52
摘要：
An apparatus includes a stage that supports a substrate, an optical system having a last optical element, that projects an image onto the substrate that is positioned spaced apart from the last optical element by a gap at least partly filled with an immersion liquid, and a pressure control system having an actuator, that controls pressure of the immersion liquid in the gap using the actuator.
公开/授权文献
- US08194229B2 Dynamic fluid control system for immersion lithography 公开/授权日：2012-06-05
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