发明申请
US20080312463A1 Organic Silane Compound, Method of Producing the Same, and Organic Thin Film Using the Same
审中-公开
有机硅烷化合物,其制造方法和使用其的有机薄膜
- 专利标题: Organic Silane Compound, Method of Producing the Same, and Organic Thin Film Using the Same
- 专利标题(中): 有机硅烷化合物,其制造方法和使用其的有机薄膜
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申请号: US11658502申请日: 2005-08-17
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公开(公告)号: US20080312463A1公开(公告)日: 2008-12-18
- 发明人: Hiroshi Imada , Hiroyuki Hanato , Toshihiro Tamura
- 申请人: Hiroshi Imada , Hiroyuki Hanato , Toshihiro Tamura
- 优先权: JP2004-243510 20040824
- 国际申请: PCT/JP2005/014996 WO 20050817
- 主分类号: C07F7/02
- IPC分类号: C07F7/02
摘要:
The present invention provides a highly ordered, crystallized organic thin film superior in electroconductive properties that is resistant to exfoliation, a compound for preparation of the thin film, and a method of producing the same.An organic silane compound, characterized in that a molecule represented by General Formula (I) is substituted with a silyl group.A method of producing the organic silane compound, comprising halogenating a molecule (I) and allowing it to react with a silane derivative.An organic thin film, wherein the organic silane compound molecule is oriented with its silyl group located in the substrate side and the molecule (I) region in the film surface side. (wherein, x1 and x2 are integers satisfying 1≦x1, 1≦x2, and 2≦x1+x2≦8; each of y1 and z1 is independently an integer of 2 to 8; each of y2 and z2 is independently an integer of 0 to 8; and the skeleton may be substituted with a hydrophobic group).
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