Invention Application
- Patent Title: Forming a cantilever assembly for verticle and lateral movement
- Patent Title (中): 形成用于垂直和横向运动的悬臂组件
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Application No.: US11824465Application Date: 2007-06-29
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Publication No.: US20090001486A1Publication Date: 2009-01-01
- Inventor: John Heck , Tsung-Kuan Allen Chou
- Applicant: John Heck , Tsung-Kuan Allen Chou
- Main IPC: H01L29/84
- IPC: H01L29/84 ; H01L21/00
Abstract:
In one embodiment, the present invention includes a method for forming a sacrificial oxide layer on a base layer of a microelectromechanical systems (MEMS) probe, patterning the sacrificial oxide layer to provide a first trench pattern having a substantially rectangular form and a second trench pattern having a substantially rectangular portion and a lateral portion extending from the substantially rectangular portion, and depositing a conductive layer on the patterned sacrificial oxide layer to fill the first and second trench patterns to form a support structure for the MEMS probe and a cantilever portion of the MEMS probe. Other embodiments are described and claimed.
Public/Granted literature
- US07687297B2 Forming a cantilever assembly for vertical and lateral movement Public/Granted day:2010-03-30
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