Invention Application
- Patent Title: Multi-Layer Semiconductor Structure and Manufacturing Method Thereof
- Patent Title (中): 多层半导体结构及其制造方法
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Application No.: US11969702Application Date: 2008-01-04
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Publication No.: US20090014787A1Publication Date: 2009-01-15
- Inventor: Ting Sing Wang
- Applicant: Ting Sing Wang
- Applicant Address: TW Hsinchu
- Assignee: PROMOS TECHNOLOGIES INC.
- Current Assignee: PROMOS TECHNOLOGIES INC.
- Current Assignee Address: TW Hsinchu
- Priority: TW096125159 20070711
- Main IPC: H01L29/78
- IPC: H01L29/78 ; H01L21/336

Abstract:
A power MOSFET structure comprises at least one first gate in the cell area and at least one second gate at the peripheral that are both in a semiconductor substrate. The first and second gates are electrically connected, and the second gate is connected to a contact so as to electrically connect to a bond pad for transmitting gate control signals. The semiconductor substrate comprises a first semiconductor layer, a second semiconductor layer and a third semiconductor layer in downward sequence. The first and third semiconductor layers are of a first conductive type, e.g., n-type, and the second semiconductor layer is of a second conductive type, e.g., p-type. The first and third semiconductor layers serve as the source and the drain, respectively.
Information query
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