Invention Application
US20090017580A1 SYSTEMS AND METHODS FOR VERTICALLY INTEGRATING SEMICONDUCTOR DEVICES 失效
用于垂直集成半导体器件的系统和方法

  • Patent Title: SYSTEMS AND METHODS FOR VERTICALLY INTEGRATING SEMICONDUCTOR DEVICES
  • Patent Title (中): 用于垂直集成半导体器件的系统和方法
  • Application No.: US11776069
    Application Date: 2007-07-11
  • Publication No.: US20090017580A1
    Publication Date: 2009-01-15
  • Inventor: Larry Smith
  • Applicant: Larry Smith
  • Assignee: Sematech, Inc.
  • Current Assignee: Sematech, Inc.
  • Main IPC: H01L21/71
  • IPC: H01L21/71 H01L23/02
SYSTEMS AND METHODS FOR VERTICALLY INTEGRATING SEMICONDUCTOR DEVICES
Abstract:
Systems and methods for vertically integrating semiconductor devices are described. In one embodiment, a method comprises providing an interposer, aligning and bonding a plurality of die to a first surface of the interposer, aligning and bonding a backplate to the plurality of die, and reducing at least one portion of the interposer to create a reconstituted wafer. In another embodiment, an apparatus comprises an interposer operable to receive at least one donor semiconductor device disposed on a first surface of the interposer and aligned therewith, and at least one host semiconductor device disposed on a second surface of the interposer and aligned therewith; where the interposer allows the at least one donor and host semiconductor devices to become vertically integrated.
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