发明申请
US20090021656A1 EXPOSURE METHOD AND APPARATUS 审中-公开
曝光方法和装置

  • 专利标题: EXPOSURE METHOD AND APPARATUS
  • 专利标题(中): 曝光方法和装置
  • 申请号: US11814745
    申请日: 2006-01-24
  • 公开(公告)号: US20090021656A1
    公开(公告)日: 2009-01-22
  • 发明人: Takao Ozaki
  • 申请人: Takao Ozaki
  • 申请人地址: JP Minato-ku, Tokyo
  • 专利权人: FUJIFILM Corporation
  • 当前专利权人: FUJIFILM Corporation
  • 当前专利权人地址: JP Minato-ku, Tokyo
  • 优先权: JP2005-016448 20050125
  • 国际申请: PCT/JP2006/301386 WO 20060124
  • 主分类号: G02F1/1335
  • IPC分类号: G02F1/1335 G03B27/52
EXPOSURE METHOD AND APPARATUS
摘要:
When an image of a two-dimensional pattern is formed on a photosensitive material by performing spatial light modulation on light emitted from a light source by a spatial light modulation means including a multiplicity of arranged pixel units and by forming an image by a second imaging optical system after forming an image of each of light beams corresponding to the pixel units, on which the spatial light modulation has been performed, by a first imaging optical system, the imaging position of each of light beams is controlled separately for each of the light beams. Accordingly, the image of the two-dimensional pattern formed on the photosensitive material coincides with an intended two-dimensional pattern.
信息查询
0/0