发明申请
- 专利标题: EXPOSURE METHOD AND APPARATUS
- 专利标题(中): 曝光方法和装置
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申请号: US11814745申请日: 2006-01-24
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公开(公告)号: US20090021656A1公开(公告)日: 2009-01-22
- 发明人: Takao Ozaki
- 申请人: Takao Ozaki
- 申请人地址: JP Minato-ku, Tokyo
- 专利权人: FUJIFILM Corporation
- 当前专利权人: FUJIFILM Corporation
- 当前专利权人地址: JP Minato-ku, Tokyo
- 优先权: JP2005-016448 20050125
- 国际申请: PCT/JP2006/301386 WO 20060124
- 主分类号: G02F1/1335
- IPC分类号: G02F1/1335 ; G03B27/52
摘要:
When an image of a two-dimensional pattern is formed on a photosensitive material by performing spatial light modulation on light emitted from a light source by a spatial light modulation means including a multiplicity of arranged pixel units and by forming an image by a second imaging optical system after forming an image of each of light beams corresponding to the pixel units, on which the spatial light modulation has been performed, by a first imaging optical system, the imaging position of each of light beams is controlled separately for each of the light beams. Accordingly, the image of the two-dimensional pattern formed on the photosensitive material coincides with an intended two-dimensional pattern.
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