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发明申请
US20090029630A1 Polishing pad, platen, method of monitoring, method of manufacturing, and method of detecting 失效
抛光垫，压板，监测方法，制造方法和检测方法

Polishing pad, platen, method of monitoring, method of manufacturing, and method of detecting
摘要：
A polishing pad, platen, method of monitoring, method of manufacturing, and method of detecting using a pseudo window area, where the pseudo window area has a thickness less than a thickness of a polishing layer and a thickness greater than zero.
摘要（中）：

抛光垫，压板，监测方法，制造方法以及使用伪窗口区域进行检测的方法，其中伪窗口区域的厚度小于抛光层的厚度，厚度大于零。

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