发明申请
- 专利标题: Fused silica having low OH, OD levels and method of making
- 专利标题(中): 熔融二氧化硅具有低OH,OD水平和制备方法
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申请号: US11881599申请日: 2007-07-27
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公开(公告)号: US20090029842A1公开(公告)日: 2009-01-29
- 发明人: Rostislav Radievich Khrapko , Nicolas LeBlond , James Edward Tingley
- 申请人: Rostislav Radievich Khrapko , Nicolas LeBlond , James Edward Tingley
- 主分类号: C03C3/04
- IPC分类号: C03C3/04 ; C03B19/00
摘要:
A fused silica article having a combined concentration of hydroxyl (OH) and deuteroxyl (OD) concentration of less than 10 parts per million (ppm) and, in one embodiment, less than 1 ppm. The fused silica article is formed by drying a soot blank in a halogen-free atmosphere comprising carbon monoxide. The dried soot blank may optionally be doped to reach target levels of OH and OD concentrations and improve homogeneity within the fused silica article. The dried soot blank is then oxidized and, sintered to form the article. A method of reducing the combined concentration of OH and OD to less than 10 ppm is also described.
公开/授权文献
- US08062986B2 Fused silica having low OH, OD levels and method of making 公开/授权日:2011-11-22
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