发明申请
US20090034147A1 Method and apparatus for providing an electrostatic chuck with reduced plasma penetration and arcing
有权
用于提供具有降低的等离子体穿透和电弧放电的静电卡盘的方法和装置
- 专利标题: Method and apparatus for providing an electrostatic chuck with reduced plasma penetration and arcing
- 专利标题(中): 用于提供具有降低的等离子体穿透和电弧放电的静电卡盘的方法和装置
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申请号: US11888311申请日: 2007-07-31
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公开(公告)号: US20090034147A1公开(公告)日: 2009-02-05
- 发明人: Kadthala Ramaya Narendrnath , Xinglong Chen , Sudhir Gondhalekar , Dmitry Lubomirsky , Muhammad Rasheed , Tony Kaushal
- 申请人: Kadthala Ramaya Narendrnath , Xinglong Chen , Sudhir Gondhalekar , Dmitry Lubomirsky , Muhammad Rasheed , Tony Kaushal
- 申请人地址: US CA Santa Clara
- 专利权人: Applied Materials, Inc.
- 当前专利权人: Applied Materials, Inc.
- 当前专利权人地址: US CA Santa Clara
- 主分类号: H01L21/683
- IPC分类号: H01L21/683 ; H01L21/67
摘要:
A method and apparatus for providing a fluid distribution element for an electrostatic chuck that reduces plasma formation and arcing within heat transfer fluid passages. One embodiment comprises a plate and a dielectric component, where the dielectric component is inserted into the plate. The plate is adapted to be positioned within a channel to define a plenum, wherein the dielectric component provides at least a portion of a fluid passage coupled to the plenum. A porous dielectric layer, formed upon the dielectric component, provides at least another portion of a fluid passage coupled to the plenum. In other embodiments, the fluid distribution element comprises various arrangements of components to define a fluid passage that does not provide a line-of-sight path from the support surface for a substrate to a plenum.
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