发明申请
- 专利标题: IMAGING DEVICE IN A PROJECTION EXPOSURE FACILITY
- 专利标题(中): 投影曝光设备中的成像装置
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申请号: US12247597申请日: 2008-10-08
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公开(公告)号: US20090040487A1公开(公告)日: 2009-02-12
- 发明人: Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schongart , Markus Neumaier , Barbel Trossbach , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
- 申请人: Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schongart , Markus Neumaier , Barbel Trossbach , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
- 申请人地址: DE Oberkochen
- 专利权人: CARL ZEISS SMT AG
- 当前专利权人: CARL ZEISS SMT AG
- 当前专利权人地址: DE Oberkochen
- 优先权: DE10162289.9 20011219; DE10225266.1 20020607
- 主分类号: G03B27/42
- IPC分类号: G03B27/42
摘要:
An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.
公开/授权文献
- US07961294B2 Imaging device in a projection exposure facility 公开/授权日:2011-06-14