发明申请
- 专利标题: METHOD OF MANUFACTURING PHOTOSENSITIVE EPOXY STRUCTURE USING PHOTOLITHOGRAPHY PROCESS AND METHOD OF MANUFACTURING INKJET PRINTHEAD USING THE METHOD OF MANUFACTURING PHOTOSENSITIVE EPOXY STRUCTURE
- 专利标题(中): 使用光刻方法制造感光环氧结构的方法和使用制造光敏环氧结构的方法制造喷墨印刷方法
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申请号: US11968809申请日: 2008-01-03
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公开(公告)号: US20090047605A1公开(公告)日: 2009-02-19
- 发明人: Moon-chul Lee , Yong-seop Yoon , Min-soo Kim , Yong-won Jeong , Dong-sik Shim
- 申请人: Moon-chul Lee , Yong-seop Yoon , Min-soo Kim , Yong-won Jeong , Dong-sik Shim
- 申请人地址: KR Suwon-si
- 专利权人: Samsung Electronics Co., Ltd
- 当前专利权人: Samsung Electronics Co., Ltd
- 当前专利权人地址: KR Suwon-si
- 优先权: KR2007-81461 20070813
- 主分类号: G03F7/22
- IPC分类号: G03F7/22 ; G03F7/26
摘要:
Provided are a method of manufacturing a photosensitive epoxy structure using a photolithograph process, and a method of manufacturing an inkjet printhead using the method of manufacturing a photosensitive epoxy structure. The method of manufacturing the photosensitive epoxy structure includes forming an epoxy material layer formed of photosensitive epoxy; forming a first exposure pattern in the epoxy material layer by performing a first exposure operation; forming a second exposure pattern in the non-exposed portions of the epoxy material layer by performing a second exposure operation; and developing the epoxy material layer, wherein the amount of first UV energy used in the first exposure operation is different from the amount of second UV energy used in the second exposure operation.
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