发明申请
US20090052033A1 Analyzer, method for cleaning photometry mechanism in such analyzer, and cleaning tool
有权
分析仪，这种分析仪中清除光度测定机制的方法和清洁工具
- 专利标题： Analyzer, method for cleaning photometry mechanism in such analyzer, and cleaning tool
- 专利标题（中）： 分析仪，这种分析仪中清除光度测定机制的方法和清洁工具
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申请号： US11918831申请日： 2006-04-19
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公开(公告)号： US20090052033A1公开(公告)日： 2009-02-26
- 发明人: Toshinori Fujiwara , Hideki Tanji , Naoyuki Usagawa
- 申请人： Toshinori Fujiwara , Hideki Tanji , Naoyuki Usagawa
- 优先权： JP2005-121833 20050420
- 国际申请： PCT/JP2006/308192 WO 20060419
- 主分类号： B08B3/00
- IPC分类号： B08B3/00
摘要：
The present invention relates to an analyzer (1) including a photometry mechanism (6) for photometrically analyzing a reagent pad of an analytical tool to which a sample is applied, and a table (4) including a placing portion (41) at which the analytical tool is to be placed. The light emitting surface (68) or the light incident surface (68) of the light from the light emitting elements (66) of the photometry mechanism (6) is cleaned, with a cleaning tool (22) placed at the table (4). The present invention further provides a cleaning tool (22) for cleaning the photometry mechanism (6) of the analyzer (1).
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