公开(公告)号：US20090052033A1

公开(公告)日：2009-02-26

申请号：US11918831

申请日：2006-04-19

申请人： Toshinori Fujiwara ,  Hideki Tanji ,  Naoyuki Usagawa

发明人： Toshinori Fujiwara ,  Hideki Tanji ,  Naoyuki Usagawa

IPC分类号： B08B3/00

CPC分类号： G01N21/15 ,  G01N21/78 ,  G01N21/8483 ,  G01N2021/152 ,  Y10T436/11

摘要： The present invention relates to an analyzer (1) including a photometry mechanism (6) for photometrically analyzing a reagent pad of an analytical tool to which a sample is applied, and a table (4) including a placing portion (41) at which the analytical tool is to be placed. The light emitting surface (68) or the light incident surface (68) of the light from the light emitting elements (66) of the photometry mechanism (6) is cleaned, with a cleaning tool (22) placed at the table (4). The present invention further provides a cleaning tool (22) for cleaning the photometry mechanism (6) of the analyzer (1).

摘要翻译： 本发明涉及一种分析装置（1），其特征在于，包括用于对应用了样品的分析用具的试剂垫进行光度分析的测光机构（6）和包括放置部（41）的台（4） 分析工具将被放置。 来自光度测量机构（6）的发光元件（66）的光的发光表面（68）或光入射表面（68）用清洁工具（22）放置在工作台（4）处， 。 本发明还提供一种用于清洁分析器（1）的测光机构（6）的清洁工具（22）。

公开(公告)号：US08460616B2

公开(公告)日：2013-06-11

申请号：US11918831

申请日：2006-04-19

申请人： Toshinori Fujiwara ,  Hideki Tanji ,  Naoyuki Usagawa

发明人： Toshinori Fujiwara ,  Hideki Tanji ,  Naoyuki Usagawa

IPC分类号： G01N15/06 ,  G01N33/00 ,  G01N33/48

CPC分类号： G01N21/15 ,  G01N21/78 ,  G01N21/8483 ,  G01N2021/152 ,  Y10T436/11

摘要： The present invention relates to an analyzer (1) including a photometry mechanism (6) for photometrically analyzing a reagent pad of an analytical tool to which a sample is applied, and a table (4) including a placing portion (41) at which the analytical tool is to be placed. The light emitting surface (68) or the light incident surface (68) of the light from the light emitting elements (66) of the photometry mechanism (6) is cleaned, with a cleaning tool (22) placed at the table (4). The present invention further provides a cleaning tool (22) for cleaning the photometry mechanism (6) of the analyzer (1).