发明申请
US20090053023A1 Wafer transfer apparatus, wafer transfer method and storage medium
有权
晶圆转印装置,晶片转印方法和存储介质
- 专利标题: Wafer transfer apparatus, wafer transfer method and storage medium
- 专利标题(中): 晶圆转印装置,晶片转印方法和存储介质
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申请号: US11892677申请日: 2007-08-24
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公开(公告)号: US20090053023A1公开(公告)日: 2009-02-26
- 发明人: Shinji Wakabayashi
- 申请人: Shinji Wakabayashi
- 优先权: JP2006-229635 20060825
- 主分类号: H01L21/677
- IPC分类号: H01L21/677
摘要:
One sensor constituted of a light emission element and a light-receiving element is provided in a path through which a wafer is transferred. The sensor is positioned so that the wafer passes through an area between the light emission element and the light-receiving element. Coordinates of the center of the wafer are calculated based on encoder values obtained when the wafer starts passing through the sensor and when the wafer completes passing through the sensor, position data of wafer transfer means corresponding to the encoder value, and the diameter of the wafer; and thereby the amount of positional deviation of the center of the wafer from a reference position is calculated.
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