发明申请
US20090056619A1 Halogen Assisted Physical Vapor Transport Method for Silicon Carbide Growth
有权
用于碳化硅生长的卤素辅助物理蒸气传输方法
- 专利标题: Halogen Assisted Physical Vapor Transport Method for Silicon Carbide Growth
- 专利标题(中): 用于碳化硅生长的卤素辅助物理蒸气传输方法
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申请号: US11846574申请日: 2007-08-29
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公开(公告)号: US20090056619A1公开(公告)日: 2009-03-05
- 发明人: Stephan G. Mueller , Hudson M. Hobgood , Valeri F. Tsvetkov
- 申请人: Stephan G. Mueller , Hudson M. Hobgood , Valeri F. Tsvetkov
- 主分类号: C30B25/00
- IPC分类号: C30B25/00
摘要:
A physical vapor transport growth technique for silicon carbide is disclosed. The method includes the steps of introducing a silicon carbide powder and a silicon carbide seed crystal into a physical vapor transport growth system, separately introducing a heated silicon-halogen gas composition into the system in an amount that is less than the stoichiometric amount of the silicon carbide source powder so that the silicon carbide source powder remains the stoichiometric dominant source for crystal growth, and heating the source powder, the gas composition, and the seed crystal in a manner that encourages physical vapor transport of both the powder species and the introduced silicon-halogen species to the seed crystal to promote bulk growth on the seed crystal.
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