发明申请
- 专利标题： BASE SOLUBLE POLYMERS FOR PHOTORESIST COMPOSITIONS
- 专利标题（中）： 用于光电组合物的基础可溶性聚合物
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申请号： US12263511申请日： 2008-11-03
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公开(公告)号： US20090061347A1公开(公告)日： 2009-03-05
- 发明人: David Abdallah , Francis Houlihan
- 申请人： David Abdallah , Francis Houlihan
- 主分类号： G03G13/10
- IPC分类号： G03G13/10 ; C08G75/00 ; C08G63/68
摘要：
Base soluble polymer comprising at least one sulfonyl group where at least one carbon atom at α-position and/or β-position and/or γ-position with respect to the sulfonyl group has a hydroxyl group, where the hydroxyl group is protected or unprotected are described.
公开/授权文献
- US08088564B2 Base soluble polymers for photoresist compositions 公开/授权日：2012-01-03
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