发明申请
- 专利标题: Apparatus and Method for Indirect Surface Cleaning
- 专利标题(中): 间接表面清洁的设备和方法
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申请号: US12277106申请日: 2008-11-24
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公开(公告)号: US20090065024A1公开(公告)日: 2009-03-12
- 发明人: Jeffrey E. LeClaire , Kenneth Gilbert Roessler , David Brinkley
- 申请人: Jeffrey E. LeClaire , Kenneth Gilbert Roessler , David Brinkley
- 主分类号: B08B7/00
- IPC分类号: B08B7/00
摘要:
Methods for cleaning a surface of a substrate and for increasing the useable lifetime of a photomask substrate are provided. In one method, a substrate has at least one radiation-produced particle disposed thereon, and a laser that has a wavelength that substantially coincides with a high absorption coefficient of the substrate is directed towards the substrate. A thermal increase is generated in the substrate, and the radiation-produced particle is removed from the substrate by transferring thermal energy from the substrate to the radiation-produced particle until the radiation-produced particle decomposes.
公开/授权文献
- US08293019B2 Apparatus and method for indirect surface cleaning 公开/授权日:2012-10-23
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