发明申请
US20090078198A1 CHAMBER COMPONENTS WITH INCREASED PYROMETRY VISIBILITY 有权
具有增加色素可见性的CHAMBER组件

CHAMBER COMPONENTS WITH INCREASED PYROMETRY VISIBILITY
摘要:
The present invention generally provides method and apparatus for non-contact temperature measurement in a semiconductor processing chamber. Particularly, the present invention provides methods and apparatus for non-contact temperature measurement for temperature below 500° C. One embodiment of the present invention provides an apparatus for processing semiconductor substrates. The apparatus comprises a target component comprises a material with higher emissivity than the one or more substrates.
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