发明申请
- 专利标题: METHOD FOR EXTENDING EQUIPMENT UPTIME IN ION IMPLANTATION
- 专利标题(中): 用于延长离子植入装置的方法
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申请号: US12234202申请日: 2008-09-19
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公开(公告)号: US20090081874A1公开(公告)日: 2009-03-26
- 发明人: Kevin S. Cook , Dennis Manning , Edward K. McIntyre , Richard Goldberg
- 申请人: Kevin S. Cook , Dennis Manning , Edward K. McIntyre , Richard Goldberg
- 主分类号: H01L21/302
- IPC分类号: H01L21/302
摘要:
The invention features in-situ cleaning process for an ion source and associated extraction electrodes and similar components of the ion-beam producing system, which chemically removes carbon deposits, increasing service lifetime and performance, without the need to disassemble the system. In particular, an aspect of the invention is directed to an activating, catalytic, or reaction promoting species added to the reactive species to effectively convert the non-volatile molecular residue into a volatile species which can be removed by conventional means.
公开/授权文献
- US07875125B2 Method for extending equipment uptime in ion implantation 公开/授权日:2011-01-25