发明申请
- 专利标题: NON-VOLATILE SEMICONDUCTOR STORAGE DEVICE AND METHOD OF MANUFACTURING THE SAME
- 专利标题(中): 非挥发性半导体存储器件及其制造方法
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申请号: US12244989申请日: 2008-10-03
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公开(公告)号: US20090090965A1公开(公告)日: 2009-04-09
- 发明人: Masaru KITO , Ryota Katsumata , Yoshiaki Fukuzumi , Masaru Kidoh , Hiroyasu Tanaka , Hideaki Aochi , Yasuyuki Matsuoka
- 申请人: Masaru KITO , Ryota Katsumata , Yoshiaki Fukuzumi , Masaru Kidoh , Hiroyasu Tanaka , Hideaki Aochi , Yasuyuki Matsuoka
- 申请人地址: JP Tokyo
- 专利权人: KABUSHIKI KAISHA TOSHIBA
- 当前专利权人: KABUSHIKI KAISHA TOSHIBA
- 当前专利权人地址: JP Tokyo
- 优先权: JP2007-262244 20071005
- 主分类号: H01L29/792
- IPC分类号: H01L29/792 ; H01L21/336
摘要:
A non-volatile semiconductor storage device has a plurality of memory strings with a plurality of electrically rewritable memory cells connected in series. Each of the memory strings includes: a memory columnar semiconductor extending in a direction perpendicular to a substrate; a tunnel insulation layer contacting the memory columnar semiconductor; a charge accumulation layer contacting the tunnel insulation layer and accumulating charges; a block insulation layer contacting the charge accumulation layer; and a plurality of memory conductive layers contacting the block insulation layer. The lower portion of the charge accumulation layer is covered by the tunnel insulation layer and the block insulation layer.
公开/授权文献
- US07902591B2 Non-volatile semiconductor storage device 公开/授权日:2011-03-08
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