Invention Application
- Patent Title: THIOL-ENE BASED POLY(ALKYLSILOXANE) MATERIALS
- Patent Title (中): 基于硫醇的聚(烷基硅氧烷)材料
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Application No.: US12250344Application Date: 2008-10-13
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Publication No.: US20090096136A1Publication Date: 2009-04-16
- Inventor: Craig J. Hawker , Luis M. Campos , Ines Meinel
- Applicant: Craig J. Hawker , Luis M. Campos , Ines Meinel
- Applicant Address: US CA Oakland
- Assignee: THE REGENTS OF THE UNIVERSITY OF CALIFORNIA
- Current Assignee: THE REGENTS OF THE UNIVERSITY OF CALIFORNIA
- Current Assignee Address: US CA Oakland
- Main IPC: B29C59/14
- IPC: B29C59/14 ; C08G75/04 ; C08G77/04 ; C08G63/06 ; B28B11/08 ; C08G63/195 ; C08F2/46

Abstract:
A stamp is comprised of a thiol-ene polymer, wherein the thiol-ene polymer allows for creation of micro-scale or nano-scale patterns useful in soft or imprint lithography. A patterned thiol-ene polymer is fabricated by casting a thiol-ene mixture onto a patterned mold, curing the thiol-ene mixture to form the patterned thiol-ene polymer, and peeling off the patterned thiol-ene polymer from the silicon mold. A stamp comprised of a thiol-ene polymer may be replicated by exposing the to oxygen plasma to form a hydrophilic mold, exposing the hydrophilic mold to a fluorinating agent under vacuum conditions to form a functionalized surface of the hydrophilic mold, casting a thiol-ene mixture on top of the functionalized surface, photocuring the thiolene mixture to form a replica thiol-ene polymer, and peeling off the replica thiol-ene polymer.
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