Invention Application
US20090098340A1 METHOD FOR NON-DESTRUCTIVE PATTERNING OF PHOTONIC CRYSTALS EMPLOYED FOR SOLID-STATE LIGHT EXTRACTION
审中-公开
用于固态光提取的光子晶体的非破坏性图案的方法
- Patent Title: METHOD FOR NON-DESTRUCTIVE PATTERNING OF PHOTONIC CRYSTALS EMPLOYED FOR SOLID-STATE LIGHT EXTRACTION
- Patent Title (中): 用于固态光提取的光子晶体的非破坏性图案的方法
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Application No.: US12250354Application Date: 2008-10-13
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Publication No.: US20090098340A1Publication Date: 2009-04-16
- Inventor: Luis M. Campos , Craig J. Hawker , Ines Meinel
- Applicant: Luis M. Campos , Craig J. Hawker , Ines Meinel
- Applicant Address: US CA Oakland
- Assignee: THE REGENTS OF THE UNIVERSITY OF CALIFORNIA
- Current Assignee: THE REGENTS OF THE UNIVERSITY OF CALIFORNIA
- Current Assignee Address: US CA Oakland
- Main IPC: B29C41/42
- IPC: B29C41/42 ; B32B3/00

Abstract:
A method for patterning metal oxides or ceramics on surfaces, and more particularly, a method of forming photonic crystals. The patterning is done using a solution coating process and a polymer-based template made by nano-imprint lithography. The methodology to pattern a sol-gel can be used to make features without the undesired scum layer. Furthermore, the patterned photonic crystals were demonstrated to efficiently increase the light extraction efficiency of solid state devices based on GaN.
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