发明申请
- 专利标题: Infrared Source and Method of Manufacturing the Same
- 专利标题(中): 红外源及其制造方法
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申请号: US12084571申请日: 2007-05-25
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公开(公告)号: US20090127478A1公开(公告)日: 2009-05-21
- 发明人: Yasuaki Inoue , Katsumoto Ikeda , Hideki Miyazaki
- 申请人: Yasuaki Inoue , Katsumoto Ikeda , Hideki Miyazaki
- 申请人地址: JP Osaka JP Tsukuba-shi
- 专利权人: NALUX CO., LTD.,NATIONAL INSTITUTE FOR MATERIALS SCIENCE
- 当前专利权人: NALUX CO., LTD.,NATIONAL INSTITUTE FOR MATERIALS SCIENCE
- 当前专利权人地址: JP Osaka JP Tsukuba-shi
- 优先权: JPPCT/JP2006/310575 20060526; JPPCT/JP2006/324023 20061130
- 国际申请: PCT/JP2007/060711 WO 20070525
- 主分类号: G01J3/10
- IPC分类号: G01J3/10 ; B23P17/00
摘要:
There is provided an infrared light source that has a simple structure and radiates infrared rays polarized in a specific direction and having a specific wavelength. The infrared light source (100) comprises a heat generator (107) and a latticework (101) in which a dielectric part (105) and a metal part (103) are alternately formed at a constant pitch in a constant direction. The infrared rays are radiated in a direction perpendicular to the surface of the latticework and are polarized in the direction indicated by an arrow A. If the constant pitch is denoted by P, the width of the dielectric part in the constant direction by T, and the specific wavelength by λ, for arbitrary P and T that meet the inequalities 0
公开/授权文献
- US08017923B2 Infrared source and method of manufacturing the same 公开/授权日:2011-09-13