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发明申请
US20090130597A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR 有权
抗蚀剂组合物，形成抗蚀剂图案，新型化合物和酸产生剂的方法

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR
摘要：
A compound represented by general formula (I); and a compound represented by general formula (b1-1). X-Q1-Y1—SO3−M+  [Chemical Formula 1] (I) X-Q1-Y1—SO3−A+ (b1-1) wherein Q1 represents a divalent linkage group or a single bond; Y1 represents an alkylene group which may have a substituent or a fluorinated alkylene group which may have a substituent; X represents a cyclic group of 3 to 30 carbon atoms which may have a substituent, and has an —SO2— bond in the structure thereof; M+ represents an alkali metal ion; and A+ represents an organic cation.
摘要（中）：

由通式（I）表示的化合物; 和由通式（b1-1）表示的化合物。 <？in-line-formula description =“In-line Formulas”end =“lead”？> X-Q1-Y1-SO3-M + [化学式1] <？in-line-formula description =“ “end =”tail“？> <？in-line-formula description =”In-line formula“end =”lead“？>（I）<？in-line-formula description =”In-line Formulas“end = “tail”？> <？in-line-formula description =“In-line Formulas”end =“lead”？> X-Q1-Y1-SO3-A + <？in-line-formula description =“In-line Formulas “end =”tail“？> <？in-line-formula description =”在线公式“end =”lead“？>（b1-1）<？in-line-formula description =”In-line Formulas“ end =“tail”？>其中Q1表示二价连接基团或单键; Y1表示可以具有取代基的亚烷基或可以具有取代基的氟化亚烷基; X表示可以具有取代基的3〜30个碳原子的环状基团，其结构中具有-SO 2 - 键; M +表示碱金属离子; 而A +代表有机阳离子。

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