发明申请
- 专利标题: PROCESS FOR PRODUCING POLYCRYSTALLINE SILICON INGOT
- 专利标题(中): 生产多晶硅硅胶的方法
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申请号: US11719675申请日: 2005-11-30
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公开(公告)号: US20090139446A1公开(公告)日: 2009-06-04
- 发明人: Yoshimichi Kimura , Yuichi Sakai
- 申请人: Yoshimichi Kimura , Yuichi Sakai
- 申请人地址: JP Taito-ku, Tokyo JP Kariya-shi, Aichi
- 专利权人: Space Energy Corporation,Noritake TCF Co., Ltd.
- 当前专利权人: Space Energy Corporation,Noritake TCF Co., Ltd.
- 当前专利权人地址: JP Taito-ku, Tokyo JP Kariya-shi, Aichi
- 优先权: JP2004-347083 20041130
- 国际申请: PCT/JP05/21969 WO 20051130
- 主分类号: C30B9/00
- IPC分类号: C30B9/00
摘要:
Provided is a process in which a polycrystalline silicon ingot improved in life time characteristics, which are correlated with the conversion efficiency of solar wafers, is inexpensively produced by the ordinary-pressure hydrogen-atmosphere melting method. In the process, the generation of oxygen and impurities in the silicon melt is inhibited and light-element impurities are removed through reaction or crystallization. Fine crystal grains can be grown at a high rate, and a high-purity polycrystalline silicon ingot having a crystal structure reduced in crystal defect can be grown.A silicon raw material is melted in an atmosphere of 100% hydrogen at ordinary pressure or an elevated pressure to prepare a silicon melt and simultaneously dissolve hydrogen in the silicon melt. The silicon melt containing hydrogen dissolved therein is solidified. Thereafter, the solid is held at a high temperature around the solidification temperature to grow silicon crystal grains in the solid phase and thereby obtain a polycrystalline silicon ingot.
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