发明申请
US20090140287A1 III Nitride Crystal Substrate, and Light-Emitting Device and Method of Its Manufacture
有权
III型氮化物晶体基板,发光元件及其制造方法
- 专利标题: III Nitride Crystal Substrate, and Light-Emitting Device and Method of Its Manufacture
- 专利标题(中): III型氮化物晶体基板,发光元件及其制造方法
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申请号: US12324897申请日: 2008-11-28
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公开(公告)号: US20090140287A1公开(公告)日: 2009-06-04
- 发明人: Shinsuke Fujiwara , Hiroaki Yoshida
- 申请人: Shinsuke Fujiwara , Hiroaki Yoshida
- 申请人地址: JP Osaka
- 专利权人: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- 当前专利权人: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- 当前专利权人地址: JP Osaka
- 优先权: JP2007-310725 20071130
- 主分类号: H01L29/20
- IPC分类号: H01L29/20 ; H01L33/00
摘要:
Toward making available III nitride crystal substrates advantageously employed in light-emitting devices, and light-emitting devices incorporating the substrates and methods of manufacturing the light-emitting devices, a III nitride crystal substrate has a major face whose surface area is not less than 10 cm2 and, in a major-face principal region excluding the peripheral margin of the major face from its outer periphery to a 5 mm separation from its outer periphery, the total dislocation density is from 1×104 cm−2 to 3×106 cm−2, and the ratio of screw-dislocation density to the total dislocation density is 0.5 or greater.
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