发明申请
- 专利标题： Imaging Device in a Projection Exposure Machine
- 专利标题（中）： 投影曝光机中的成像装置
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申请号： US12363065申请日： 2009-01-30
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公开(公告)号： US20090141258A1公开(公告)日： 2009-06-04
- 发明人: Stephan Back , Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schoengart , Markus Neumaier , Baerbel Schwaer , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
- 申请人： Stephan Back , Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schoengart , Markus Neumaier , Baerbel Schwaer , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
- 申请人地址： DE Oberkochen
- 专利权人： Carl Zeiss SMT AG
- 当前专利权人： Carl Zeiss SMT AG
- 当前专利权人地址： DE Oberkochen
- 优先权： DE10162289.9 20011219; DE10225266.1 20020607
- 主分类号： G03B27/54
- IPC分类号： G03B27/54 ; G02B15/14
摘要：
An imaging device in a projection exposure machine for microlithography includes at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. The linear drive has at least one moving element, the moving element having a shearing part and a lifting part. The shearing part is arranged to move the optical element and the lifting part is arranged to move the shearing part. The linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part.
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