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1.发明授权公开(公告)号：US08319944B2
公开(公告)日：2012-11-27
申请号：US12825001
申请日：2010-06-28
申请人： Helmut Beierl , Sascha Bleidistel , Wolfgang Singer , Toralf Gruner , Alexander Epple , Norbert Wabra , Susanne Beder , Jochen Weber , Heiko Feldmann , Baerbel Schwaer , Olaf Rogalsky , Ari Kazi
发明人： Helmut Beierl , Sascha Bleidistel , Wolfgang Singer , Toralf Gruner , Alexander Epple , Norbert Wabra , Susanne Beder , Jochen Weber , Heiko Feldmann , Baerbel Schwaer , Olaf Rogalsky , Ari Kazi
CPC分类号： G03F7/70341 , G03F7/70891
摘要： A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable for imaging the object. The projection exposure apparatus also has an adjustable manipulator for reducing an image field curvature which is caused by heating of the medium during the projection operation.
摘要翻译： 微光刻投影曝光装置包括将物体成像到平面上并具有弯曲表面的透镜的投影物镜。 在投影物镜中，存在液体或固体介质，其直接邻接可用于成像物体的区域上的曲面。 投影曝光装置还具有可调节的操纵器，用于降低在投影操作期间由介质的加热引起的图像场曲率。
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公开(公告)号：US07830611B2
公开(公告)日：2010-11-09
申请号：US11971328
申请日：2008-01-09
申请人： Olaf Conradi , Sascha Bleidistel , Markus Hauf , Wolfgang Hummel , Arif Kazi , Baerbel Schwaer , Jochen Weber , Hubert Holderer , Payam Tayebati , Boris Bittner
发明人： Olaf Conradi , Sascha Bleidistel , Markus Hauf , Wolfgang Hummel , Arif Kazi , Baerbel Schwaer , Jochen Weber , Hubert Holderer , Payam Tayebati , Boris Bittner
CPC分类号： G02B27/0068 , G02B3/14 , G03F7/70266 , G03F7/70825
摘要： A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.
摘要翻译： 微光刻投影曝光装置的投影物镜包括用于减小旋转非对称图像误差的操纵器。 操纵器又包含透镜，光学元件和形成在透镜和光学元件之间的间隙，其可以填充液体。 此外还提供至少一个致动器作用于透镜，这可以产生透镜的旋转非对称变形。
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公开(公告)号：US20060164619A1
公开(公告)日：2006-07-27
申请号：US11316160
申请日：2005-12-21
申请人： Stephan Back , Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schoengart , Markus Neumaier , Baerbel Schwaer , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
发明人： Stephan Back , Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schoengart , Markus Neumaier , Baerbel Schwaer , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
IPC分类号： G03B27/54
CPC分类号： G03F7/70825 , G03F7/70258
摘要： An imaging device in a projection exposure machine for microlithography comprises at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. Said linear drive has at least one moving element, said moving element having a shearing part and a lifting part. Said shearing part is arranged to move the optical element and said lifting part is arranged to move said shearing part. Said linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part.
摘要翻译： 用于微光刻的投影曝光机中的成像装置包括至少一个光学元件和至少一个操纵器，用于操纵光学元件的位置的线性驱动器。 所述线性驱动器具有至少一个移动元件，所述移动元件具有剪切部分和提升部分。 所述剪切部分被布置成移动光学元件，并且所述提升部分被布置成移动所述剪切部分。 所述线性驱动器具有支撑元件，该支撑元件在剪切部分被提升部分移动的同时与光学元件接触并防止其移动。
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公开(公告)号：US20110019169A1
公开(公告)日：2011-01-27
申请号：US12896128
申请日：2010-10-01
申请人： Olaf Conradi , Boris Bittner , Sascha Bleidistel , Markus Hauf , Wolfgang Hummel , Arif Kazi , Baerbel Schwaer , Jochen Weber , Hubert Holderer , Payam Tayebati
发明人： Olaf Conradi , Boris Bittner , Sascha Bleidistel , Markus Hauf , Wolfgang Hummel , Arif Kazi , Baerbel Schwaer , Jochen Weber , Hubert Holderer , Payam Tayebati
IPC分类号： G03B27/52
CPC分类号： G02B27/0068 , G02B3/14 , G03F7/70266 , G03F7/70825
摘要： A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.
摘要翻译： 微光刻投影曝光装置的投影物镜包括用于减小旋转非对称图像误差的操纵器。 操纵器又包含透镜，光学元件和形成在透镜和光学元件之间的间隙，其可以填充液体。 此外还提供至少一个致动器作用于透镜，这可以产生透镜的旋转非对称变形。
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公开(公告)号：US20090141258A1
公开(公告)日：2009-06-04
申请号：US12363065
申请日：2009-01-30
申请人： Stephan Back , Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schoengart , Markus Neumaier , Baerbel Schwaer , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
发明人： Stephan Back , Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schoengart , Markus Neumaier , Baerbel Schwaer , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
CPC分类号： G03F7/70258 , G03F7/70825
摘要： An imaging device in a projection exposure machine for microlithography includes at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. The linear drive has at least one moving element, the moving element having a shearing part and a lifting part. The shearing part is arranged to move the optical element and the lifting part is arranged to move the shearing part. The linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part.
摘要翻译： 用于微光刻的投影曝光机中的成像装置包括至少一个光学元件和至少一个操纵器，用于操纵光学元件的位置的线性驱动器。 线性驱动器具有至少一个移动元件，移动元件具有剪切部分和提升部分。 剪切部分被布置成移动光学元件，并且提升部分被布置成移动剪切部分。 线性驱动器具有支撑元件，该支撑元件在通过提升部分移动剪切部分的同时与光学元件接触并防止其移动。
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公开(公告)号：US07990622B2
公开(公告)日：2011-08-02
申请号：US12896128
申请日：2010-10-01
申请人： Olaf Conradi , Boris Bittner , Sascha Bleidistel , Markus Hauf , Wolfgang Hummel , Arif Kazi , Baerbel Schwaer , Jochen Weber , Hubert Holderer , Payam Tayebati
发明人： Olaf Conradi , Boris Bittner , Sascha Bleidistel , Markus Hauf , Wolfgang Hummel , Arif Kazi , Baerbel Schwaer , Jochen Weber , Hubert Holderer , Payam Tayebati
CPC分类号： G02B27/0068 , G02B3/14 , G03F7/70266 , G03F7/70825
摘要： A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.
摘要翻译： 微光刻投影曝光装置的投影物镜包括用于减小旋转非对称图像误差的操纵器。 操纵器又包含透镜，光学元件和形成在透镜和光学元件之间的间隙，其可以填充液体。 此外还提供至少一个致动器作用于透镜，这可以产生透镜的旋转非对称变形。
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公开(公告)号：US20080239503A1
公开(公告)日：2008-10-02
申请号：US11971328
申请日：2008-01-09
申请人： Olaf Conradi , Sascha Bleidistel , Markus Hauf , Wolfgang Hummel , Arif Kazi , Baerbel Schwaer , Jochen Weber , Hubert Holderer , Payam Tayebati , Boris Bittner
发明人： Olaf Conradi , Sascha Bleidistel , Markus Hauf , Wolfgang Hummel , Arif Kazi , Baerbel Schwaer , Jochen Weber , Hubert Holderer , Payam Tayebati , Boris Bittner
CPC分类号： G02B27/0068 , G02B3/14 , G03F7/70266 , G03F7/70825
摘要： A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.
摘要翻译： 微光刻投影曝光装置的投影物镜包括用于减小旋转非对称图像误差的操纵器。 操纵器又包含透镜，光学元件和形成在透镜和光学元件之间的间隙，其可以填充液体。 此外还提供至少一个致动器作用于透镜，这可以产生透镜的旋转非对称变形。
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8.发明授权公开(公告)号：US07782440B2
公开(公告)日：2010-08-24
申请号：US11719074
申请日：2005-11-17
申请人： Helmut Beierl , Sascha Bleidistel , Wolfgang Singer , Toralf Gruner , Alexander Epple , Norbert Wabra , Susanne Beder , Jochen Weber , Heiko Feldmann , Baerbel Schwaer , Olaf Rogalsky , Ari Kazi
发明人： Helmut Beierl , Sascha Bleidistel , Wolfgang Singer , Toralf Gruner , Alexander Epple , Norbert Wabra , Susanne Beder , Jochen Weber , Heiko Feldmann , Baerbel Schwaer , Olaf Rogalsky , Ari Kazi
CPC分类号： G03F7/70341 , G03F7/70891
摘要： A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable for imaging the object. The projection exposure apparatus also has an adjustable manipulator for reducing an image field curvature which is caused by heating of the medium during the projection operation.
摘要翻译： 微光刻投影曝光装置包括将物体成像到平面上并具有弯曲表面的透镜的投影物镜。 在投影物镜中，存在液体或固体介质，其直接邻接可用于成像物体的区域上的曲面。 投影曝光装置还具有可调节的操纵器，用于降低在投影操作期间由介质的加热引起的图像场曲率。
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公开(公告)号：US20100128367A1
公开(公告)日：2010-05-27
申请号：US12403526
申请日：2009-03-13
申请人： Mariella Beckenbach , Klaus Rief , Andreas Bertele , Benjamin Sigel , Sascha Bleidistel , Wolfgang Hummel , Andreas Frommeyer , Toralf Gruner , Jochen Schwaer , Baerbel Schwaer , Thomas Schletterer , Artur Hoegele , Armin Schoeppach
发明人： Mariella Beckenbach , Klaus Rief , Andreas Bertele , Benjamin Sigel , Sascha Bleidistel , Wolfgang Hummel , Andreas Frommeyer , Toralf Gruner , Jochen Schwaer , Baerbel Schwaer , Thomas Schletterer , Artur Hoegele , Armin Schoeppach
IPC分类号： G02B7/02
CPC分类号： G03F7/70825 , G02B7/023 , G02B13/14 , G02B27/0068 , G03F7/70058 , G03F7/70266
摘要： A projection objective for a microlithography apparatus with improved imaging properties is provided. A manipulator for a projection objective is provided. A microlithography apparatus including a projection objective of this type and/or a manipulator of this type is provided. A method for improving the imaging properties of a projection objective is provided.
摘要翻译： 提供了具有改善的成像特性的微光刻设备的投影物镜。 提供了一种用于投影物镜的操纵器。 提供包括这种类型的投影物镜和/或这种类型的操纵器的微光刻设备。 提供了一种用于改善投影物镜的成像特性的方法。
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公开(公告)号：US07486382B2
公开(公告)日：2009-02-03
申请号：US11316160
申请日：2005-12-21
申请人： Stephan Back , Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schoengart , Markus Neumaier , Baerbel Schwaer , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
发明人： Stephan Back , Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schoengart , Markus Neumaier , Baerbel Schwaer , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
CPC分类号： G03F7/70825 , G03F7/70258
摘要： An imaging device in a projection exposure machine for microlithography includes at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. The linear drive has at least one moving element, the moving element having a shearing part and a lifting part. The shearing part is arranged to move the optical element and the lifting part is arranged to move the shearing part. The linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part.
摘要翻译： 用于微光刻的投影曝光机中的成像装置包括至少一个光学元件和至少一个操纵器，用于操纵光学元件的位置的线性驱动器。 线性驱动器具有至少一个移动元件，移动元件具有剪切部分和提升部分。 剪切部分被布置成移动光学元件，并且提升部分被布置成移动剪切部分。 线性驱动器具有支撑元件，该支撑元件在通过提升部分移动剪切部分的同时与光学元件接触并防止其移动。
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