发明申请
- 专利标题: Oxide Isolated Metal Silicon-Gate JFET
- 专利标题(中): 氧化物隔离金属硅栅极JFET
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申请号: US12276574申请日: 2008-11-24
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公开(公告)号: US20090142889A1公开(公告)日: 2009-06-04
- 发明人: Madhukar B. Vora , Ashok Kumar Kapoor
- 申请人: Madhukar B. Vora , Ashok Kumar Kapoor
- 申请人地址: US CA Los Gatos
- 专利权人: DSM Solutions, Inc.
- 当前专利权人: DSM Solutions, Inc.
- 当前专利权人地址: US CA Los Gatos
- 主分类号: H01L21/337
- IPC分类号: H01L21/337
摘要:
A JFET structure with self-aligned metal source, drain and gate contacts with very low resistivity and very small feature sizes. Small source, drain and gate openings are etched in a thin dielectric layer which has a thickness set according to the desired source, gate and drain opening sizes, said dielectric layer having a nitride top layer. Metal is deposited on top of said dielectric layer to fill said openings and the metal is polished back to the top of the dielectric layer to achieve thin source, drain and gate contacts. Some embodiments include an anti-leakage poly-silicon layer lining the contact holes and all embodiments where spiking may occur include a barrier metal layer.
公开/授权文献
- US07713804B2 Method of forming an oxide isolated metal silicon-gate JFET 公开/授权日:2010-05-11
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