Invention Application
- Patent Title: HIGH RESOLUTION GAS FIELD ION COLUMN WITH REDUCED SAMPLE LOAD
- Patent Title (中): 高分辨率气体场离子柱与减少样品负载
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Application No.: US12277818Application Date: 2008-11-25
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Publication No.: US20090146074A1Publication Date: 2009-06-11
- Inventor: Helmut BANZHOF , Juergen FROSIEN , Dieter WINKLER
- Applicant: Helmut BANZHOF , Juergen FROSIEN , Dieter WINKLER
- Applicant Address: DE Heimstetten
- Assignee: ICT Integrated Circuit Testing Gesellschaft fuer Halbleiterprueftechnik mbH
- Current Assignee: ICT Integrated Circuit Testing Gesellschaft fuer Halbleiterprueftechnik mbH
- Current Assignee Address: DE Heimstetten
- Priority: EP07023587.4 20071205
- Main IPC: H01J3/14
- IPC: H01J3/14
Abstract:
A method of operating a focused ion beam device having a gas field ion source is described. According to some embodiments, the method includes emitting an ion beam from a gas field ion source, providing an ion beam column ion beam energy in the ion beam column which is higher than the final beam energy, decelerating the ion beam for providing a final beam energy on impingement of the ion beam on the specimen of 1 keV to 4 keV, and imaging the specimen.
Public/Granted literature
- US08735847B2 High resolution gas field ion column with reduced sample load Public/Granted day:2014-05-27
Information query
