公开(公告)号：US08049180B2

公开(公告)日：2011-11-01

申请号：US11925598

申请日：2007-10-26

申请人： Juergen Frosien ,  Helmut Banzhof

发明人： Juergen Frosien ,  Helmut Banzhof

IPC分类号： B01D59/44

CPC分类号： H01J49/288 ,  H01J37/05 ,  H01J37/08 ,  H01J37/28 ,  H01J2237/057 ,  H01J2237/0805 ,  H01J2237/3174 ,  H01J2237/31749

摘要： An ion beam device is described. The ion beam device includes an ion beam source for generating an ion beam, the ion beam being emitted along a first axis, an aperture unit adapted to shape the ion beam, and an achromatic deflection unit adapted to deflect ions of the ion beam having a predetermined mass by a deflecting angle. The achromatic deflection unit includes: an electric field generating component for generating an electric field, and a magnetic field generating component for generating a magnetic field substantially perpendicular to the electric field. The device further includes a mass separation aperture adapted for blocking ions with a mass different from the predetermined mass and for allowing ions having the predetermined mass to trespass the mass separator, and an objective lens having a second optical axis, wherein the second optical axis is inclined with regard to the first axis.

摘要翻译： 描述了离子束装置。 离子束装置包括用于产生离子束的离子束源，沿着第一轴发射的离子束，适于使离子束成形的孔单元，以及适于使离子束的离子偏转的消色差偏转单元， 预定质量的偏转角。 无彩色偏转单元包括：用于产生电场的电场产生部件和用于产生基本上垂直于电场的磁场的磁场产生部件。 该装置还包括质量分离孔，其适于阻挡具有不同于预定质量的质量的离子，并允许具有预定质量的离子侵入质量分离器，以及具有第二光轴的物镜，其中第二光轴为 相对于第一轴倾斜。

公开(公告)号：US07763866B2

公开(公告)日：2010-07-27

申请号：US10576547

申请日：2004-10-19

申请人： Jürgen Frosien ,  Stefan Lanio ,  Helmut Banzhof

发明人： Jürgen Frosien ,  Stefan Lanio ,  Helmut Banzhof

IPC分类号： G21K5/00

CPC分类号： H01J37/09 ,  H01J2237/0455

摘要： The present invention relates to a charged particle beam device (1) for inspecting or structuring a specimen (3) comprising a charged particle beam source (5) to generate a charged particle beam (7), a focussing lens (9) to focus the charged particle beam (7) onto the specimen (3), and an aperture system (13) for defining an aperture (6) for the charged particle beam (7). The aperture system (13) includes a first member (20) to block a first portion (7a) of the charged particle beam (7) between the charged particle beam source (5) and the focussing lens (9), a second member (30) to block a second portion (7b) of the charged particle beam (7) between the charged particle beam source (5) and the focussing lens (9), first means (24) for moving the first member (20) to adjust the size of the blocked first portion (7a) of the charged particle beam (7), and second means (34) for moving the second member (30) independently from the first portion (7b). With such aperture system (13), it is possible to freely adjust the size of the aperture (6) and align it to the optical axis (8) during operation.

摘要翻译： 本发明涉及一种用于检查或构造包括带电粒子束源（5）以产生带电粒子束（7）的样本（3）的带电粒子束装置（1），聚焦透镜（9） 带电粒子束（7）到样品（3）上，以及孔径系统（13），用于限定带电粒子束（7）的孔（6）。 孔径系统（13）包括阻挡带电粒子束源（5）和聚焦透镜（9）之间的带电粒子束（7）的第一部分（7a）的第一构件（20），第二构件 30）阻挡带电粒子束源（5）和聚焦透镜（9）之间的带电粒子束（7）的第二部分（7b），第一装置（24）用于移动第一构件（20）以调整 带电粒子束（7）的阻挡的第一部分（7a）的尺寸以及用于独立于第一部分（7b）移动第二部件（30）的第二装置（34）。 利用这种孔径系统（13），可以在操作期间自由地调整孔径（6）的尺寸并将其对准光轴（8）。

公开(公告)号：US09153413B2

公开(公告)日：2015-10-06

申请号：US12528307

申请日：2008-02-22

申请人： Gilad Almogy ,  Avishai Bartov ,  Juergen Frosien ,  Pavel Adamec ,  Helmut Banzhof

发明人： Gilad Almogy ,  Avishai Bartov ,  Juergen Frosien ,  Pavel Adamec ,  Helmut Banzhof

IPC分类号： G21K7/00 ,  H01J37/05 ,  H01J37/10 ,  H01J37/147 ,  H01J37/28

CPC分类号： H01J37/05 ,  H01J37/10 ,  H01J37/147 ,  H01J37/28 ,  H01J2237/0635 ,  H01J2237/1508 ,  H01J2237/2449 ,  H01J2237/2817

摘要： A multi-beam scanning electron beam device (100) is described. The multi-bea scanning electron beam device having a column, includes a multi-beam emitter (110) for emitting a plurality of electron beams (12,13,14), at least one common electron beam optical element (130) having a common opening for at least two of the plurality of electron beams and being adapted for commonly influencing at least two of the plurality of electron beams, at least one individual electron beam optical element (140) for individually influencing the plurality of electron beams, a common objective lens assembly (150) for focusing the plurality of electrons beams having a common excitation for focusing at least two of the plurality of electron beams, and adapted for focusing the plurality of electron beams onto a specimen (20) for generation of a plurality of signal beams (121, 131,141), and a detection assembly (170) for individually detecting each signal beam on a corresponding detection element.

摘要翻译： 描述了多光束扫描电子束装置（100）。 具有列的多头扫描电子束装置包括用于发射多个电子束（12,13,14）的多光束发射器（110），至少一个共同的电子束光学元件（130） 用于多个电子束中的至少两个的开口，并适用于共同影响多个电子束中的至少两个，用于单独影响多个电子束的至少一个单独的电子束光学元件（140），共同的目标 透镜组件（150），用于聚焦具有用于聚焦多个电子束中的至少两个的共同激发的多个电子束，并且适于将多个电子束聚焦到样本（20）上以产生多个信号 光束（121,131,141）和检测组件（170），用于分别检测相应检测元件上的每个信号光束。

公开(公告)号：US20110163229A1

公开(公告)日：2011-07-07

申请号：US12528306

申请日：2008-02-22

申请人： Juergen Frosien ,  Helmut Banzhof ,  Pavel Adamec

发明人： Juergen Frosien ,  Helmut Banzhof ,  Pavel Adamec

IPC分类号： G01N23/225 ,  G01N23/227 ,  G01N23/22 ,  G01N23/203 ,  H01J1/50

CPC分类号： H01J37/05 ,  H01J37/10 ,  H01J37/147 ,  H01J37/28 ,  H01J2237/0635 ,  H01J2237/1508 ,  H01J2237/2449 ,  H01J2237/2817

摘要： A scanning charged particle beam device (100) is described. The scanning charged particle beam device includes a beam emitter (102) for emitting a primary electron beam, a first scan stage for scanning the beam over a specimen, an achromatic beam separator (130) adapted for separating a signal electron beam from the primary electron beam, and a detection unit (172,174,178) for detecting signal electrons.

摘要翻译： 描述扫描带电粒子束装置（100）。 扫描带电粒子束装置包括用于发射一次电子束的射束发射器（102），用于扫描试样上的束的第一扫描级，适于从一次电子分离信号电子束的消色束分离器（130） 以及用于检测信号电子的检测单元（172,174,178）。

公开(公告)号：US20100320382A1

公开(公告)日：2010-12-23

申请号：US12528307

申请日：2008-02-22

申请人： Gilad Almogy ,  Avishai Bartov ,  Jürgen Frosien ,  Pavel Adamec ,  Helmut Banzhof

发明人： Gilad Almogy ,  Avishai Bartov ,  Jürgen Frosien ,  Pavel Adamec ,  Helmut Banzhof

IPC分类号： G01N23/00 ,  H01J37/147

CPC分类号： H01J37/05 ,  H01J37/10 ,  H01J37/147 ,  H01J37/28 ,  H01J2237/0635 ,  H01J2237/1508 ,  H01J2237/2449 ,  H01J2237/2817

摘要： A multi-beam scanning electron beam device (100) is described. The multi-bea scanning electron beam device having a column, includes a multi-beam emitter (110) for emitting a plurality of electron beams (12,13,14), at least one common electron beam optical element (130) having a common opening for at least two of the plurality of electron beams and being adapted for commonly influencing at least two of the plurality of electron beams, at least one individual electron beam optical element (140) for individually influencing the plurality of electron beams, a common objective lens assembly (150) for focusing the plurality of electrons beams having a common excitation for focusing at least two of the plurality of electron beams, and adapted for focusing the plurality of electron beams onto a specimen (20) for generation of a plurality of signal beams (121, 131,141), and a detection assembly (170) for individually detecting each signal beam on a corresponding detection element.

摘要翻译： 描述了多光束扫描电子束装置（100）。 具有列的多头扫描电子束装置包括用于发射多个电子束（12,13,14）的多光束发射器（110），至少一个共同的电子束光学元件（130） 用于多个电子束中的至少两个的开口，并适用于共同影响多个电子束中的至少两个，用于单独影响多个电子束的至少一个单独的电子束光学元件（140），共同的目标 透镜组件（150），用于聚焦具有用于聚焦多个电子束中的至少两个的共同激发的多个电子束，并且适于将多个电子束聚焦到样本（20）上以产生多个信号 光束（121,131,141）和检测组件（170），用于分别检测相应检测元件上的每个信号光束。

公开(公告)号：US08735847B2

公开(公告)日：2014-05-27

申请号：US12277818

申请日：2008-11-25

申请人： Helmut Banzhof ,  Juergen Frosien ,  Dieter Winkler

发明人： Helmut Banzhof ,  Juergen Frosien ,  Dieter Winkler

IPC分类号： G21K1/08

CPC分类号： H01J37/04 ,  H01J37/28 ,  H01J2237/0473 ,  H01J2237/0475 ,  H01J2237/0492 ,  H01J2237/08 ,  H01J2237/0807

摘要： A method of operating a focused ion beam device having a gas field ion source is described. According to some embodiments, the method includes emitting an ion beam from a gas field ion source, providing an ion beam column ion beam energy in the ion beam column which is higher than the final beam energy, decelerating the ion beam for providing a final beam energy on impingement of the ion beam on the specimen of 1 keV to 4 keV, and imaging the specimen.

摘要翻译： 描述了具有气体场离子源的聚焦离子束装置的操作方法。 根据一些实施例，该方法包括从气体场离子源发射离子束，在离子束列中提供高于最终光束能量的离子束柱离子束能量，使离子束减速以提供最终光束 将离子束撞击在1keV至4keV的样品上的能量，并对样品进行成像。

公开(公告)号：US07838830B2

公开(公告)日：2010-11-23

申请号：US11923407

申请日：2007-10-24

申请人： Juergen Frosien ,  Helmut Banzhof ,  Jacob Levin ,  Dror Shemesh

发明人： Juergen Frosien ,  Helmut Banzhof ,  Jacob Levin ,  Dror Shemesh

IPC分类号： G01N23/00

CPC分类号： H01J37/1478 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/1506 ,  H01J2237/2448 ,  H01J2237/26 ,  H01J2237/2806 ,  H01J2237/31745 ,  H01J2237/31749

摘要： A charged particle beam apparatus is provided, which comprises a charged particle beam column for generating a primary charged particle beam; a focusing assembly, such as a charged particle lens, e.g., an electrostatic lens, for focusing the primary charged particle beam on a specimen; a detector for detecting charged signal particles which are emerging from the specimen; and a deflector arrangement for deflecting the primary charged particle beam. The deflector arrangement is arranged downstream of the focusing assembly and is adapted for allowing the charged signal particles passing therethrough. The detector is laterally displaced with respect to the optical axis in a deflection direction defined by the post-focusing deflector arrangement.

摘要翻译： 提供带电粒子束装置，其包括用于产生初级带电粒子束的带电粒子束柱; 聚焦组件，例如带电粒子透镜，例如静电透镜，用于将初级带电粒子束聚焦在样本上; 用于检测从样本出现的带电信号颗粒的检测器; 以及用于偏转初级带电粒子束的偏转器装置。 偏转器布置布置在聚焦组件的下游，并且适于允许带电信号颗粒通过其中。 检测器在由后聚焦偏转器布置限定的偏转方向上相对于光轴横向移位。

公开(公告)号：US20080073583A1

公开(公告)日：2008-03-27

申请号：US11675689

申请日：2007-02-16

申请人： Thomas JASINSKI ,  Helmut BANZHOF ,  Jurgen FROSIEN

发明人： Thomas JASINSKI ,  Helmut BANZHOF ,  Jurgen FROSIEN

IPC分类号： H01J37/08

CPC分类号： H01J37/304 ,  H01J2237/1532 ,  H01J2237/31755

摘要： An ion beam apparatus is provided, the ion beam apparatus comprising a movable ion source, a condenser lens, an aperture, and a scanning unit disposed between the condenser lens and the aperture, said scanning unit being adapted to scan an ion beam across the aperture. Furthermore, a method for aligning components of an ion beam apparatus is provided, comprising the steps of: producing an ion beam by means of an ion source, producing a first image of a beam cross section of the ion beam at a first voltage of a condenser lens, producing a second image of the beam cross section of the ion beam at a second voltage of the condenser lens, and positioning the ion source so that the centers of the first and second images coincide.

摘要翻译： 提供离子束装置，离子束装置包括可移动离子源，聚光透镜，孔径和设置在聚光透镜和孔之间的扫描单元，所述扫描单元适于扫过离子束穿过孔 。 此外，提供了一种用于对准离子束装置的部件的方法，包括以下步骤：通过离子源产生离子束，产生离子束的束截面的第一图像，其中第一电压为 聚光透镜，在聚光透镜的第二电压下产生离子束的束横截面的第二图像，并且定位离子源使得第一和第二图像的中心重合。

公开(公告)号：US08294096B2

公开(公告)日：2012-10-23

申请号：US13089059

申请日：2011-04-18

申请人： Helmut Banzhof

发明人： Helmut Banzhof

IPC分类号： G21K1/08 ,  G01N23/00

CPC分类号： H01J37/28 ,  H01J37/1478 ,  H01J37/153 ,  H01J37/263 ,  H01J2237/1534 ,  H01J2237/2809 ,  H01J2237/2814

摘要： A charged particle beam device is provided, including: a charged particle beam source adapted to generate a charged particle beam on an axis; an optical aberration correction device and an objective lens device, which define a corrected beam aperture angle adjusted to reduce diffraction; and a charged particle beam tilting device; wherein the optical aberration correction device and the objective lens device are adapted to provide the charged particle beam with a beam aperture angle smaller than the corrected beam aperture angle; and wherein the charged particle beam tilting device is adapted to provide a beam tilt angle which is equal or less than the corrected beam aperture angle. Further, a method of operating a charged particle beam device is provided.

摘要翻译： 提供带电粒子束装置，包括：带电粒子束源，适于在轴上产生带电粒子束; 光学像差校正装置和物镜装置，其限定校正后的光束孔径角度，以减小衍射; 和带电粒子束倾斜装置; 其中所述光学像差校正装置和所述物镜装置适于为所述带电粒子束提供小于校正的光束孔径角的光束孔径角; 并且其中所述带电粒子束倾斜装置适于提供等于或小于所述校正光束孔径角的光束倾斜角度。 此外，提供了一种操作带电粒子束装置的方法。

公开(公告)号：US08164067B2

公开(公告)日：2012-04-24

申请号：US12701463

申请日：2010-02-05

申请人： Pavel Adamec ,  Helmut Banzhof ,  Ivo Liska

发明人： Pavel Adamec ,  Helmut Banzhof ,  Ivo Liska

IPC分类号： G01N23/22 ,  G01N23/00

CPC分类号： H01J37/244 ,  H01J37/28 ,  H01J2237/2446

摘要： It is provided a charged particle beam device for inspecting a specimen, comprising a charged particle beam source adapted to generate a primary charged particle beam; an objective lens device adapted to direct the primary charged particle beam onto the specimen; and a detector device comprising one or more charged particle detectors adapted to detect a secondary charged particle beam generated by the primary charged particle beam at the specimen and passing through the objective lens device, the secondary charged particle beam comprising a first group of secondary charged particles starting from the specimen with high starting angles and a second group of secondary charged particles starting from the specimen with low starting angles; wherein at least one of the charged particle detectors is adapted to detect depending on the starting angles one group of the first and the second groups of secondary charged particles.

摘要翻译： 提供了一种用于检查样本的带电粒子束装置，包括适于产生初级带电粒子束的带电粒子束源; 适于将初级带电粒子束引导到样本上的物镜装置; 以及检测器装置，其包括一个或多个带电粒子检测器，其适于检测在所述样本处由所述初级带电粒子束产生的并通过所述物镜装置的次级带电粒子束，所述次级带电粒子束包括第一组次级带电粒子 从具有较高起始角度的样品开始，第二组二次带电粒子从起始角低的样品开始; 其中所述带电粒子检测器中的至少一个适于根据起始角度检测一组第一和第二组次级带电粒子。