发明申请
- 专利标题: NON-VOLATILE SEMICONDUCTOR STORAGE DEVICE AND METHOD OF MANUFACTURING THE SAME
- 专利标题(中): 非挥发性半导体存储器件及其制造方法
-
申请号: US12325023申请日: 2008-11-28
-
公开(公告)号: US20090146206A1公开(公告)日: 2009-06-11
- 发明人: Yoshiaki Fukuzumi , Ryota Katsumata , Masaru Kidoh , Masaru Kito , Hiroyasu Tanaka , Hideaki Aochi , Yasuyuki Matsuoka
- 申请人: Yoshiaki Fukuzumi , Ryota Katsumata , Masaru Kidoh , Masaru Kito , Hiroyasu Tanaka , Hideaki Aochi , Yasuyuki Matsuoka
- 申请人地址: JP Tokyo
- 专利权人: KABUSHIKI KAISHA TOSHIBA
- 当前专利权人: KABUSHIKI KAISHA TOSHIBA
- 当前专利权人地址: JP Tokyo
- 优先权: JP2007-311291 20071130
- 主分类号: H01L27/115
- IPC分类号: H01L27/115 ; H01L21/336 ; H01L29/792 ; H01L21/8247
摘要:
A non-volatile semiconductor storage device has a plurality of memory strings with a plurality of electrically rewritable memory cells connected in series. Each of the memory strings includes: a first columnar semiconductor layer extending in a direction perpendicular to a substrate and having a first hollow extending downward from its upper end; a first insulation layer formed in contact with the outer wall of the first columnar semiconductor layer; a second insulation layer formed on the inner wall of the first columnar semiconductor layer so as to leave the first hollow; and a plurality of first conductive layers formed to sandwich the first insulation layer with the first columnar semiconductor layer and functioning as control electrodes of the memory cells.
公开/授权文献
信息查询
IPC分类: