发明申请
- 专利标题: NITRIDE SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- 专利标题(中): 氮化物半导体器件及其制造方法
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申请号: US12327874申请日: 2008-12-04
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公开(公告)号: US20090146308A1公开(公告)日: 2009-06-11
- 发明人: Katsuomi Shiozawa , Kyozo Kanamoto , Hiroshi Kurokawa , Yasunori Tokuda , Kyosuke Kuramoto , Hitoshi Sakuma
- 申请人: Katsuomi Shiozawa , Kyozo Kanamoto , Hiroshi Kurokawa , Yasunori Tokuda , Kyosuke Kuramoto , Hitoshi Sakuma
- 申请人地址: JP Tokyo
- 专利权人: MITSUBISHI ELECTRIC CORPORATION
- 当前专利权人: MITSUBISHI ELECTRIC CORPORATION
- 当前专利权人地址: JP Tokyo
- 优先权: JP2007-317070 20071207
- 主分类号: H01L21/28
- IPC分类号: H01L21/28 ; H01L29/45
摘要:
A nitride semiconductor device with a p electrode having no resistance between itself and other electrodes, and a method of manufacturing the same are provided. A p electrode is formed of a first Pd film, a Ta film, and a second Pd film, and on a p-type contact layer of a nitride semiconductor. On the second Pd film, a pad electrode is formed. The second Pd film is formed on the entire upper surface of the Ta film which forms part of the p electrode, and serves as an antioxidant film that prevents oxidation of the Ta film. Preventing oxidation of the Ta film, the second Pd film can reduce the resistance that may exist between the p electrode and the pad electrode, thereby preventing a failure in contact between the p electrode and the pad electrode and providing the p electrode with low resistance.
公开/授权文献
- US07795738B2 Nitride semiconductor device 公开/授权日:2010-09-14
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